The Sc −, Ti −, V −, Co −, Ni − and Cu − secondary ion energy distributions resulting from Ar + and Cs + primary io bombardment of the respective metal surfaces could be reconstructed from two velocity dependent functions. One dominated at lower emission energies (0–30 eV) while the other at higher emission energies (> 40 eV). Energy distributions collected as a function of the implanted Cs + concentration indicated that both contributions varied in intensity, independently of each other. Characteristic velocity values, extracted from inverse velocity versus corrected intensity plots, revealed that the lower energy contribution followed an A (electron affinity) dependence, while the higher energy contribution exhibited a Φ − A dependence (where Φ is the substrate workfunction). The characteristic velocities of the lower energy contribution were also found to be systematically lower than those of the higher energy contribution. These trends are indicative of the Auger and resonant electron transfer processes, respectively.