Semiconductor quantum dots have been widely researched as a means of improving the performance of optoelectronic devices. Self-assembly has been the dominant method of fabricating quantum dots because of its relative ease compared to more explicit techniques. We have developed a method for fabricating quantum dots in a more explicit manner using electron beam lithography and selective-area metal-organic chemical vapor deposition crystal growth. By eliminating the dependence on strain-driven self-assembly, we can avoid the size distribution and resulting inhomogeneously broadened emission spectrum associated with self-assembled quantum dot ensembles. We report on the threshold and spectral properties of patterned quantum dot lasers. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)