Using a novel organo-metallic chemical vapor deposition plasma immersion ion processing technique, titanium carbo-nitride (Ti–C–N) coatings were deposited from an organo-metallic CVD precursor, tetrakis-dimethylamino titanium. Different carrier gases (acetylene, ammonia, argon and nitrogen) were made to flow through the precursor reservoir at 20 sccm so that the coating composition could be modified. Deposited coatings had thickness in the range of 300–1000 nm as determined by surface profilometry. Titanium concentrations in the coatings ranged from 10.8 to 15.1 at%. Hardness values of these coatings ranged from ≈8–14 GPa while residual stresses were in the range from −440 to −100 MPa, as determined by nanoindentation and wafer curvature techniques, respectively. Coefficient of friction values ranged from 0.2 to 0.45, and were lowest for coatings with low titanium content. Hardness, coefficient of friction and residual stress increased with increasing titanium content. Wear resistance was determined by a pin-on-disk technique and wear coefficients ranged from 0.005×10 −6 to 2×10 −6 mm 3/N m, increasing with increasing hardness indicating an abrasive wear mechanism.