The chemical mechanical polishing (CMP) is extensively applied in sapphire substrate processing. However, the mechanism is unclear because of the challenging in the dynamic characterization. In this paper, effects of the polishing speeds, slurry concentrations, and abrasive sizes on the removal action of granular flow in sapphire CMP are investigated using the discrete particle model (DPM) and densely discrete phase model (DDPM). Contours of the residence time, concentration, and abrasive velocity present that rotation speeds of the wafer and pad (30 and 80 rpm respectively) are beneficial to improving sapphire CMP performance. When the SiO2 slurry concentration is higher than 1 wt%, DDPM is more suitable for the fluid-solid flow in sapphire CMP compared to DPM. As the slurry concentration increases, the growth trend of material removal rate (MRR) slows down because of the reduction of the integral particle erosion ratio (PER). The 100 nm SiO2 abrasive can obtain the maximum MRR (10.90×10−9 nm/s), although its PER is 2 × 10−5 of 5 µm particles’ PER. The in-situ atomic force microscopy experiments prove the MRR function of granular flow owing to the hydro-dynamic contact. In addition, the removal ability will be improved by enhancing the interactive force between the abrasive and sapphire. It provides a novel idea to boost the efficiency of sapphire CMP.