Ideality Factor Research Articles

Enhancing photodetector performance of MoS2 thin films by nitrogen ion irradiation

In this work, MoS2 thin films were grown on a Si substrate using RF sputtering, and subsequently subjected to nitrogen ion irradiation with varying ion fluence. The Raman spectroscopy observed the oxygen doping into MoS2 lattice and induced shift in E2g and A1g vibration modes, along with a decrease in the interdefect distance (LD) after ion irradiation. The evolution of oxygen into MoS2 sample after ion irradiation was confirmed by XPS. The incorporation of oxygen in the MoS2 is due to the bond breaking of the surface layers of the material due to ion irradiation, which creates dangling bonds. These bonds in the MoS2 are more reactive with the oxygen and lead to the formation of MoOx species on the surface of the material. The Field Emission Scanning Electron Microscopy (FESEM) provides the morphological study of post-irradiation samples. As ion fluence increases, the optical bandgap decreases from 1.46 eV to 1.33 eV. Using current-voltage (I–V) characteristics, the electrical properties of the irradiated films were characterized, along with photodetector measurements. This combined analysis provided a comprehensive understanding of the film's electrical behaviour, shedding light on their post-irradiation performance. Our results demonstrate that due to oxygen doped into MoS2/Si thin film significantly affects the barrier height, ideality factor, and carrier concentration in I–V characteristics. Taking silicon-based and n-type MoS2 heterojunction photodetectors, its photoresponsivity can reach ∼14.7 mA/W at 7.19 × 1016 ion-cm−2 ion fluence. Our findings provide insights into the tunability of the electrical properties of MoS2/Si thin films through ion irradiation, which has implications for the development of novel electronic and optoelectronic devices based on MoS2/Si thin film.

Investigation of hybrid CuPc-doped ZnO/p-silicon photodiodes for photonic and electronic applications

Copper phthalocyanine (CuPc) doped zinc oxide (ZnO) interlayered Al/p-Si Schottky barrier diodes (SBDs) were systematically fabricated utilizing spin coating technique. This study was undertaken to meticulously assess the influence of varying concentrations of CuPc on the intricate electrical and photodiode characteristics of these devices. The investigation involved the characterization of the current–voltage (I–V) characteristics configured with distinct different doping concentrations of CuPc such as 0.05 wt%,1 wt%, 2 wt%, under a wide range of voltages (± 5 V) and illumination irradiances. These measurements enabled the calculation of various critical electrical variables, such as the ideality factor (n), barrier height (ΦB), series resistance (Rs), shunt resistance (Rsh), interface states density (Nss) and their response under various illumination levels (between 10 and 100 mW/cm2) and under dark condition. An increase in the reverse current as the illumination increases suggested the potential utility of these SBDs as photodiodes, photosensors, or photodetectors. Notably, the linear dynamic range (LDR), a crucial factor for image sensors which obtained around 14 for all photodiodes. The photodiodes exhibited a good rectification ratio (RR) of approximately 104. The results obtained indicate that the rectifying properties of the structures can be controlled by CuPc doping. In addition, the results indicated that the presence of CuPc significantly influenced the values of n, ΦB, Rs/Rsh, and Nss. To further analyze the devices, capacitance–voltage (C–V) and conductance–voltage (G–V) measurements were carried out to determine parameters such as diffusion potential (VD), dopant acceptor atoms concentration (NA), Fermi energy level (EF), and width of depletion layer (WD) at both 1 kHz and 1 MHz. The measurements revealed that the capacitance values were higher at low frequencies compared to high frequencies, and this behavior was attributed to Nss. In summary, this study suggests that the manufactured photodiodes have the potential to be employed as photodiodes, sensors, or detectors in optical sensing applications, and their performance can be tailored by adjusting the concentration of CuPc in the ZnO interlayered structures. The discerned outcomes revealed the substantial influence of CuPc concentration on key electrical parameters, with conspicuous trends noted in the values of n, ΦB, Rs/Rsh, and Nss. Furthermore, the observed increase in the reverse current as the illumination level increases highlights the potential utility of these SBDs as sensitive photodiodes/sensors/detectors.

Competition between Transport and Recombination in Dye Solar Cells at Low Light Intensity

The efficiency of electron collection in a dye‐sensitized solar cell (DSC) is determined by a delicate balance between electronic transport and recombination losses caused by electron transfer to dye cations and electron acceptors. While state‐of‐the‐art DSCs have demonstrated quantitative electron collection under standard 1 sun conditions, the nonlinear nature of the trapping/detrapping dynamics in the photoanode with respect to the stored electronic charge can result in suboptimal performance under the low illumination intensity conditions commonly found indoors. Herein, the key factors influencing electron collection in relation to light intensity using impedance spectroscopy and numerical analysis are thoroughly examined. Impedance analysis reveals that the electron diffusion length tends to decrease as the quasi‐Fermi level is lowered, approaching the critical limit (Ln/d ≈ 1) at intensities characteristic of indoor illumination. A range of tert‐butyl pyridine concentrations and different thermal and chemical treatments of the TiO2 are tested, showing that this low intensity limitation is inherent to the multiple‐trapping mechanism that governs the functioning of a DSC. It is concluded that relatively high ideality factors, nonoptimal electrolyte compositions, or small variations in the quality of the TiO2 layer can result in electron collection limitations that are not apparent under 1 sun but become noticeable at low light intensities.

Synthesis of 2D yttrium zinc oxide nanosheets via simple chemical route toward high performance Schottky diode based on large charge carriers density and photoresponsivity

Yttrium zinc oxide (Zn0.85Y0.15O) nanostructures were stoichiometrically prepared by co-precipitation method. XRD, EDX, XPS, SEM, and TEM spectroscopy were examined to investigate structure, composition, and morphological characteristics. The synthesized nanocomposite exhibited polycrystalline structure with small crystallite size ∼ 27 nm in which the particles appeared in sheets like shape with high atomic density on surface. The optical parameters including energy gap (Eg) and refractive index (n) were investigated from (T%) and (R%) measurements through wavelength range from 300–900 nm. Al/Y:ZnO/p-Si/Ag Schottky diode was fabricated using thermal evaporating technique and its current–voltage (I–V) was analyzed using different models. The photodiode showed non-ideal behavior with ideality factor greater than unity and small potential barrier. Under various illuminations, the photodiode has revealed high photosensitivity attributed to trapped charge carriers at the interface. The charge carrier density Nd and built-in voltage Vbi were estimated from Mott Schottky (M–S) function suggesting high Schottky diode efficiency.

Photoelectrochemical Properties of Chemical Bath Deposited CdNiSe Thin Films

The chemical bath deposition approach was used to prepare Cd1−xNixSe thin film photoelectrodes on a substrate made of stainless-steel plate. The constructed cell has the configuration: p-CdNiSe | NaOH (1M)+S (1M)+Na2S (1M) | C (graphite). Studying current-voltage characteristics in the dark, capacitance–voltage in the dark, barrier-height measurements, power output, photo response, and spectral response are all part of characterizing the photoelectrochemical cell of the photoelectrodes. For the composition of Cd0.7Ni0.3Se, the junction ideality factor was determined to be minimal. It was discovered that the flat band potential and barrierheight was 710 mV and 0.181 eV respectively. The power output characteristic reveals that, for composition x = 0.3, the short circuit current, open circuit voltage, conversion efficiency and fill factor are respectively, 161 μA/cm2, 260 mV, 0.64% and 48.11%. The greatest current recorded at 725 nm is displayed in the spectral response.

Illumination dependent electrical, photosensitivity and photodetectivity properties of Au/SiO2/n-Si structures: optoelectronic situations

Abstract This study aims to examine the electrical, photosensitivity (S), photo-response (R), and photo-detectivity (D*) properties of Au/SiO2/n-type Si structures under different illumination intensities. The illumination-dependent properties of the Au/SiO2/n-type Si structure with SiO2 interlayer were obtained using current–voltage (I-V) characteristics. The ideality factors (n) and barrier heights (Φbo) values of Au/SiO2/n-type Si structures were obtained and compared from forward and reverse bias current–voltage (I-V) measurements at room temperature. Also, barrier heights (Φbo) and series resistance (R S ) values obtained from Norde method were compared with the values obtained from TE theory. It was observed that ideality factor and barrier height values obtained from forward bias region are higher than the values reverse bias. This means that the linearity or rectification feature in the reverse bias region is better than the forward bias region. Furthermore, photodiode values such as photo response (R), photosensitivity (S) and photodetectivity (D*) of Au/SiO2/n type Si structures were also examined depending on the light intensity. Consequently, the experimental results showed that the increase in reverse current with increasing light indicates that the Au/SiO2/n-type Si structures can be used in semiconductor technology as a photodiode, detector or sensor.

Optoelectronic properties of Au/n-type Si semiconductor structures with SiO2 interlayer

In this study, we investigated the effect of light intensity on electrical and photovoltaic properties using current-voltage (I–V) measurements at room temperature of Au/n-type Si structures with SiO2 interface layer. At each light intensity, the obtained main electrical characteristics such as ideality factors (n), barrier heights (Φbo), rectification ratios (RR), saturation currents (I0) and series resistances (RS) of Au/SiO2/n-type Si structures were calculated from both thermionic emission (TE) and Cheung methods using I–V measurements and compared to each other. Experimental results showed that while the n and I0 values increased with the increase in the light intensity, the Φbo and RR values decreased. While the ideality factor values obtained using the TE method ranged between 1.973 (at dark) and 2.250 (for 100 mW/cm2), these values were obtained between 3.227 and 3.482 using the Cheung method. At the same time, while the barrier height values obtained using the TE method ranged between 0.865 eV (at dark) and 0.817 eV (for 100 mW/cm2), these values were obtained between 0.773 eV and 0.742 eV using the Cheung method. It was observed that while the n values obtained from TE theory were smaller than the values obtained from the Cheung method, the Φbo values were larger than the values obtained from the Cheung function. Furthermore, for the Au/SiO2/n-type Si structures, the photovoltaic parameters such as short circuit current (Isc) and open circuit voltage (Voc) and photocurrent (Iph) were examined under dark, daylight and various light intensities (from 20 to 100 mW/cm2).

Effect of 1 wt% Dimethyl Sulfoxide on the Electrical and Photovoltaic Parameters of Schottky Diodes and Organic Solar Cells Based on PEDOT:PSS

Herein, the electrical conductivity of poly(3,4‐ethylenedioxythiophene)–poly(styrenesulfonate) (PEDOT:PSS) polymer is improved by adding dimethyl sulfoxide (DMSO) and electrical characterization of the obtained Schottky diode and organic solar cell (OSC) devices are performed from I–V measurements under the light and dark conditions. The scanning electron microscope images of the poly(3‐hexylthiophene):[6,6]‐phenylC61‐butyric acid methylester active layer and PEDOT:PSS layer are obtained. The series resistance (Rs), barrier height (Фb), and ideality factor (n) parameters are obtained from different techniques as a function of light and dark conditions. Furthermore, photovoltaic parameters are calculated for n‐Si/PEDOT:PSS/Au device without DMSO doping and with DMSO doping as a parameter of the light condition and the interface state densities of these devices are obtained for light and dark conditions. DMSO organic solvent improves the short‐circuit current density (Isc), power convert efficiency (or η), open circuit‐voltage (Voc), shunt resistance (Rsh), and series resistance (Rs) values of OSCs. In summary, DMSO solvent rearranges the conductive of PEDOT:PSS, decreases the work function of this conductive polymer (≈5 eV), decreases energy loss in the charge transportation, and increases photovoltaic parameters of Schottky barrier diode and OSC devices.

Synthesis and characteristics of a monocrystalline GaAs/β-Ga2O3p-n heterojunction

Beta phase-gallium oxide (β-Ga2O3) is an emerging ultrawide bandgap semiconductor but lacks efficient p-type doping, which hinders development of high-performance bipolar heterojunction devices. This study introduces the synthesis and characterization of a monocrystalline GaAs/β-Ga2O3p-n heterojunction, employing advanced semiconductor grafting technology. The heterojunction was innovatively fabricated by grafting a p-type GaAs single crystal nanomembrane to an Al2O3-coated n-type β-Ga2O3 epitaxial substrate. The synthesized heterojunction was comprehensively characterized. The band alignment of grafted GaAs/β-Ga2O3p-n heterojunction was experimentally constructed through X-ray photoelectron spectroscopy (XPS), and the result is in accordance with the theorical prediction based on the electron affinity rule. The resulting GaAs/β-Ga2O3p-n diodes built on this heterojunction exhibit remarkable performance metrics, including an ideality factor of 1.23, a high rectification ratio of 8.04 × 109 at ± 4 V, and a turn on voltage at 2.35 V. Furthermore, at + 5 V, the diode displays a large current density of 2500 A/cm2 along with a low ON resistance of 2 mΩ∙cm2. This study marks the first successful demonstration of a high-quality grafted GaAs/β-Ga2O3p-n heterojunction, establishing a critical building block for the further development of bipolar Ga2O3-based device applications such as diodes, transistors, and thyristors.

Comparative Study on Schottky Contact Behaviors between Ga- and N-Polar GaN with SiNx Interlayer

We conducted a comparative study on the characterization of Ga-polar and N-polar GaN metal–insulator–semiconductor (MIS) Schottky contact with a SiNx gate dielectric. The correlation between the surface morphology and the current–voltage (I–V) characteristics of the Ga- and N-polar GaN Schottky contact with and without SiNx was established. The insertion of SiNx helps in reducing the reverse leakage current for both structures, even though the leakage is still higher for N-polar GaN, consistent with the Schottky barrier height calculated using X-ray photoelectron spectroscopy. To optimize the electric property of the N-polar device, various substrate misorientation angles were adopted. Among the different misorientation angles of the sapphire substrate, the GaN MIS Schottky barrier diode grown on 1° sapphire shows the lowest reverse leakage current, the smoothest surface morphology, and the best crystalline quality compared to N-polar GaN grown on 0.2° and 2° sapphire substrates. Furthermore, the mechanism of the reverse leakage current of the MIS-type N-polar GaN Schottky contact was investigated by temperature-dependent I–V characterization. FP emissions are thought to be the dominant reverse conduction mechanism for the N-polar GaN MIS diode. This work provides a promising approach towards the optimization of N-polar electronic devices with low levels of leakage and a favorable ideality factor.

A biomimetic approach to modulating the sustained release of fibroblast growth factor 2 from fibrin microthread scaffolds.

The pleiotropic effect of fibroblast growth factor 2 (FGF2) on promoting myogenesis, angiogenesis, and innervation makes it an ideal growth factor for treating volumetric muscle loss (VML) injuries. While an initial delivery of FGF2 has demonstrated enhanced regenerative potential, the sustained delivery of FGF2 from scaffolds with robust structural properties as well as biophysical and biochemical signaling cues has yet to be explored for treating VML. The goal of this study is to develop an instructive fibrin microthread scaffold with intrinsic topographic alignment cues as well as regenerative signaling cues and a physiologically relevant, sustained release of FGF2 to direct myogenesis and ultimately enhance functional muscle regeneration. Heparin was passively adsorbed or carbodiimide-conjugated to microthreads, creating a biomimetic binding strategy, mimicking FGF2 sequestration in the extracellular matrix (ECM). It was also evaluated whether FGF2 incorporated into fibrin microthreads would yield sustained release. It was hypothesized that heparin-conjugated and co-incorporated (co-inc) fibrin microthreads would facilitate sustained release of FGF2 from the scaffold and enhance in vitro myoblast proliferation and outgrowth. Toluidine blue staining and Fourier transform infrared spectroscopy confirmed that carbodiimide-conjugated heparin bound to fibrin microthreads in a dose-dependent manner. Release kinetics revealed that heparin-conjugated fibrin microthreads exhibited sustained release of FGF2 over a period of one week. An in vitro assay demonstrated that FGF2 released from microthreads remained bioactive, stimulating myoblast proliferation over four days. Finally, a cellular outgrowth assay suggests that FGF2 promotes increased outgrowth onto microthreads. It was anticipated that the combined effects of fibrin microthread structural properties, topographic alignment cues, and FGF2 release profiles will facilitate the fabrication of a biomimetic scaffold that enhances the regeneration of functional muscle tissue for the treatment of VML injuries.

Investigation of cryogenic current–voltage anomalies in SiGe HBTs: Role of base–emitter junction inhomogeneities

The deviations of cryogenic collector current–voltage characteristics of SiGe heterojunction bipolar transistors (HBTs) from ideal drift-diffusion theory have been a topic of investigation for many years. Recent work indicates that direct tunneling across the base contributes to the non-ideal current in highly scaled devices. However, cryogenic discrepancies have been observed even in older-generation devices for which direct tunneling is negligible, suggesting that another mechanism may also contribute. Although similar non-ideal current–voltage characteristics have been observed in Schottky junctions and were attributed to a spatially inhomogeneous junction potential, this explanation has not been considered for SiGe HBTs. Here, we experimentally investigate this hypothesis by characterizing the collector current ideality factor and built-in potential of a SiGe HBT vs temperature using a cryogenic probe station. The temperature dependence of the ideality factor and the relation between the built-in potential as measured by capacitance–voltage and current–voltage characteristics are in good qualitative agreement with the predictions of a theory of electrical transport across a spatially inhomogeneous junction. These observations suggest that inhomogeneities in the base–emitter junction potential may contribute to the cryogenic non-idealities. This work helps to identify the physical mechanisms limiting the cryogenic microwave noise performance of SiGe HBTs.

Forward leakage currents in GaN p-i-n diodes

Excessive forward leakage currents in GaN p-i-n diodes were investigated. Traditional diffusion mechanism dominates at VF > 2 V. The effective band gap is derived to be ∼2.21 eV, which is much lower than 3.4 eV and attributed to a band fluctuation caused by dislocations; At 1.35 V < VF < 2 V, a trap-assisted tunneling process becomes important, whose ideality factor is still larger than 4.1 at T = 400 K; Two distinct power-law relationships were observed at lower biases, separated at VF = 0.8 V, whose exponents are extracted to be ∼8 and ∼4, respectively. The behavior is in a good agreement with the space-charge-limited model, featuring an exponentially decaying distribution of trap states below the conduction band.

Research on screening strategy of Organic Rankine Cycle working fluids based on quantum chemistry

The screening of working fluids is one of the key components in the study of power generation systems utilizing low-temperature waste heat. However, the variety of working fluids and their complex composition increase the difficulty of screening working fluids. In this study, a screening strategy for working fluids was developed from the perspective of the thermodynamic physical properties of working fluids. A comparative ideal gas heat capacity via the reduced ideal gas heat capacity factor (RCF) was proposed to characterize the dry and wet properties of working fluids, where RCF &gt; 1 indicated a dry working fluid and RCF &lt; 1 indicated a wet working fluid. A three-step screening strategy was developed for working fluid screening for organic Rankine cycles (ORCs). The strategy comprised basic physical property analysis of working fluids, research on dry and wet properties, and quantum chemical analysis. By comparing the RCF calculation result of 23 selected working fluid with values from the literature, the relative deviations of the data were less than 6.64% overall, indicating that the calculation result of the RCFs is reliable. The selection strategy explains the mechanism of working fluid selection in ORC systems from both micro- and macro-perspectives, laying a foundation for the study of structure-activity relationships in working fluids for ORCs.

Lanthanum(III)hydroxide Nanoparticles and Polyethyleneimine-Functionalized Graphene Quantum Dot Nanocomposites in Photosensitive Silicon Heterojunctions.

Lanthanides are largely used in optoelectronics as dopants to enhance the physical and optical properties of semiconducting devices. In this study, lanthanum(III)hydroxide nanoparticles (La(OH)3NPs) are used as a dopant of polyethylenimine (PEI)-functionalized nitrogen (N)-doped graphene quantum dots (PEI-NGQDs). The La(OH)3NPs-dopedPEI-NGQDs nanocomposites are prepared from La(NO)3 in a single step by a green novel method and are characterized by Fourier-transform infrared spectroscopy (FT-IR), ultraviolet-visible spectroscopy (UV-vis), X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM). Deposited over an n-type Si wafer, the La(OH)3NPs-dopedPEI-NGQDs nanocomposites form Schottky diodes. The I-V characteristics and the photoresponse of the diodes are investigated as a function of the illumination intensity in the range 0-110 mW cm-2 and at room temperature. It is found that the rectification ratio and ideality factor of the diode decrease, while the Schottky barrier and series resistance increase with the enhancing illuminations. As a photodetector, the La(OH)3NPs-dopedPEI-NGQDs/n-Si heterojunction exhibits an appreciable responsivity of 3.9 × 10-3 AW-1 under 22 mW cm-2 at -0.3 V bias and a maximum detectivity of 8.7 × 108 Jones under 22 mW cm-2 at -0.5 V. This study introduces the green synthesis and presents the structural, electrical, and optoelectronic properties of La(OH)3NPs-dopedPEI-NGQDs, demonstrating that these nanocomposites can be promising for optoelectronic applications.

Methyl-ammonium lead iodide hybrid perovskite thin film as active material for energy conversion devices

The use of hybrid halide Perovskites is helping us get closer to our aim of completely selfsufficient structures in terms of energy production. Preparation of a device of photoactive material CH3NH3PbI3 {FTO (Fluorine-doped tin Oxide)/ CH3NH3PbI3/SpiroOMeTAD/Al} for the photovoltaic applications has been described in this article. Producing a homogeneous thin film through the use of lower temperature, processedsolution devices with one-step spin coating processes is an essential stage in the fabrication process. To generate the thin films on the FTO-substrate, the one-step spin coating approach was utilized for the deposition of the precursor solution, which consisted of methylammonium iodide and lead iodide in a molar ratio of 3:1. This technique was employed to prepare the thin films. The FESEM technique was utilized to carry out the investigation of the surface morphology of this thin layer. In addition, the essential parameters of this device, like barrier height, saturation current, current density, ideality factor, carrier mobility, resistance, carrier lifetime, and capacitance have been computed using current-voltage (I-V) characteristics and the impedance spectroscopy technique. A laser with a power of 20 milliwatts and a wavelength of 532 nanometers was used to light the gadget. The current conduction mechanism exhibits ohmic behavior at a low voltage, while at medium voltages, TFSCLC is the mechanism that regulates charge transportation. Despite the fact that TCSCLC is demonstrated at higher voltages. The TCSCLC model was used to conduct an investigation of the hole's mobility.

Separation of wafer bonding interface from heterogenous mismatched interface achieved high quality bonded Ge-Si heterojunction

In the realm of optoelectronic integration, silicon-based Ge bonding has attracted great attention due to its advantages in short-wave infrared response and low cost. However, owing to the inherent lattice mismatch and thermal mismatch between Ge and Si, the bonded Ge-Si heterogenous interfaces encountered problems of thermal instability and high interface states. Herein, an approach of separating the bonding interface from the heterogenous interface is proposed through inserting a Ge epitaxial layer (GeEL) between the Si substrate and Ge film. This separation modifies the bonding interface to a homogenous one, alleviating the massive mismatch stress and achieving film relaxation, enhancing bonding stability in all aspects. Moreover, during 850 °C annealing, GeEL is doped via diffusion hence realizes electric filed modulation, inhibiting the carrier recombination leakage current and trap assisted tunneling in this defect-rich layer. A Ge-Si heterogenous PIN diode prepared by this bonding method has achieved a remarkable low dark current density (1.33 mA/cm2), a low ideality factor (1.11), and a high on–off ratio (106), confirming the outstanding quality of the bonded heterojunction. This work provides great prospects for higher performance, larger scale and multi-functional Si-based heterogenous material device applications.

High performance of Ag/AlN/Si Schottky diode: Study of the DC sputtering power effect on its electrical properties

The DC sputtering power (DCSP) effect on the chemical composition, structural and electrical properties of Ag/AlN/Si Schottky diode was studied. The AlN films grown on Si substrate were examined by X-ray diffraction (XRD), Fourier Transformed Infra-Red (FTIR), and Raman spectroscopy. The analyzes by XRD, FTIR and Raman show stability at the level of the structure and the qualitative chemical composition of the AlN layer for DCSP of 200 W and 400 W. However, the quantity of chemical compounds on the surface of AlN is affected by this variation. From Current-Voltage (I-V) measurements, the ideality factor (n), barrier height (φb), and series resistance (Rs) were extracted by adopting Cheung functions. Diodes with an AlN interlayer elaborated at 400 W have good rectifying behavior with n, Rs and φb of 3.11, 1930 Ω, and 0.93 eV, respectively. The enhancement of the Ag/AlN/Si diode performance was attributed to the reduction of undesirable impurities in the Ag/AlN interface as well as the morphological improvement of the AlN layer. Capacitance-Voltage (C-V) measurements showed that carrier donor concentrations are strongly affected by DC sputtering power. The elaborate structures may provide new materials with electrical properties having a wide range of applications in electronics and photovoltaic field.

On the temperature dependence of the current conduction mode in non-homogeneous Pt/n-GaN Schottky barrier diode

Forward current-voltage (I–V) measurements of Pt/n-GaN Schottky barrier diode (SBD) are investigated in a wide temperature range (80–400 K). The temperature dependence of the effective Schottky barrier height (SBH) and ideality factor are analyzed on the basis of the thermionic emission (TE) model by considering a double Gaussian distribution (DGD) of SBH due to the presence of barrier height inhomogeneities at the Pt/n-GaN interface. In the high temperature (HT) region (200–400 K), Pt/n-GaN SBD exhibits nearly an ideal behavior in accordance with the TE conduction mode. The obtained values of the homogeneous SBH Φ‾0bn = 1.33 eV and Richardson constant AHT* = 26.86 A cm−2 K−2are in agreement with the theoretical values for n-type GaN. In the low temperature (LT) region (80–160 K), the corresponding values Φ‾0bn = 0.94 eV and ALT* = 14.74 A cm−2 K−2 deduced within the TE mode deviate strongly from the ideal behavior. This deviation is further confirmed by the large ideality factor. In this work, we provide a strong evidence that the tunneling current including thermionic field emission (TFE) largely dominates the conduction mode at low temperature.

Spectroscopic and electronic investigations on tin(II) 2,3-naphthalocyanine/p-Si heterojunction for optoelectronic applications

The spectroscopic and electronic properties of small-molecular organic semiconductors in thin films are a significant aspect that controls the performance of their optical/optoelectronic devices. A heterojunction of thermal vacuum deposited film of tin(II)2,3-naphthalocyanine (SnNc) dye onto a p-type Si wafer (SnNc/p-Si) was fabricated. The morphology of SnNc thin film onto Si wafer was explored using the Field Emission Scanning Electron Microscope (FE-SEM). The specular reflectance and the fluorescent properties of SnNc thin film onto Si wafer were investigated. The PL emission spectra of SnNc/p-Si emission bands are related to the B and Q absorption bands for SnNc. The spectral behavior of the refractive index and the specific polarizability for both SnNc/Glass and SnNc/p-Si were extracted. Under varying temperatures (298–378 K), the electronic properties of the SnNc/p-Si heterojunction were analyzed in dark conditions. The diode parameters of SnNc/p-Si heterojunctions, which exhibited temperature-dependent behavior, were extracted from the current–voltage (I-V) procedure. According to the Cheung-Cheung and Norde procedure, the essential electrical diode parameters of the SnNc/p-Si device, such as the ideality factor, the series resistance, and barrier height, were estimated. The photoconductivity parameters, such as the photocurrent, the sensitivity, and the responsivity of the SnNc/p-Si devices, were estimated. These findings can be helpful and utilized in optoelectronic and organic electronic applications.