Graphene field effect transistors (GFETs) are typically benchmarked based on their field effect mobility. Constant mobility model proposed by Kim1 et.al is extensively used to derive this mobility parameter by directly fitting the transfer curves of graphene devices. Various methodologies were suggested to supplant and improve this existing mobility model. Among them Zhang2 et.al suggested the need for using measured gate oxide capacitance in order to extract mobility for top-gated GFETs. One of the commonly overlooked features, in the case of back gated GEFTs is the dopant concentration or the resistivity of Si substrate used. Herein, we explore the dependence of graphene carrier mobility on the induced carrier concentration and depletion capacitance of underlying Si substrate. Si with resistivities 0.01-0.02 Ω-cm and 0.001-0.005 Ω-cm were used to grow 10 nm thermal SiO2. GFETs were fabricated using CVD graphene on top of this thermal oxide substrate and the corresponding transfer curves are co-related with the capacitance density measured from corresponding MOSCAP structure. Detailed carrier mobility extraction and results are presented.(1) Kim, S.; Nah, J.; Jo, I.; Shahrjerdi, D.; Colombo, L.; Yao, Z.; Tutuc, E.; Banerjee, S. K. Realization of a High Mobility Dual-Gated Graphene Field-Effect Transistor with Al2O3 Dielectric. Appl. Phys. Lett. 2009, 94 (6). https://doi.org/10.1063/1.3077021.(2) Zhang, Z.; Xu, H.; Zhong, H.; Peng, L. M. Direct Extraction of Carrier Mobility in Graphene Field-Effect Transistor Using Current-Voltage and Capacitance-Voltage Measurements. Appl. Phys. Lett. 2012, 101 (21). https://doi.org/10.1063/1.4768690.