This study investigates the impact of a Carmoisine azo dye layer on electronic transport at the p-silicon/Al interface. The morphology of the Carmoisine azo layer is characterized using atomic force microscopy (AFM). Various spectroscopic measurements, including nuclear magnetic resonance (NMR), ultraviolet–visible (UV–Vis), and Fourier transform infrared (FTIR) spectroscopy, are employed to analyze the Carmoisine dye molecule. The direct and indirect band gap values of the Carmoisine dye molecule, prepared in methanol solvent, are determined to be Eg,1 = 2.15 eV and 2.06 eV (D band) and Eg,2 = 3.54 eV and 3.35 eV (C band), respectively. Results indicate that the Carmoisine film on a glass slide consists of non-homogeneous microstructures, with a surface roughness of 16.76 nm. A spin coater is used to form an Al/Carmoisine/p-Si device, which is a cost-effective and readily scalable approach for creating semiconductor films. The basic contact parameters of the Al/p-Si and Al/Carmoisine/p-Si contacts are measured using current-voltage (IV) and capacitance-voltage (CV) techniques. The Al/Carmoisine/p-Si device exhibits good rectifying behaviour, with an ideality factor value of 1.547, indicating that the Carmoisine azo dye used as the interface material enhances the junction's performance and reduces the ideality factor. Barrier height (BH) parameters are calculated to be 0.770 eV, 0.733 eV, and 0.799 eV using the lnI-V, Cheung, and Norde techniques, respectively. The interfacial dipole created by passivation of the film causes the Carmoisine interlayer to raise the BH, resulting in an improved interface region for Al/p-Si structures. The extracted interfacial level concentration (Nss) of the Al/Carmoisine/p-Si junction is lower than that of the Al/p-Si contact, indicating that the Carmoisine dye molecule reduces the Nss value. Furthermore, the reverse bias 1/C2-V characteristic is employed to analyze the barrier height values and compare the findings to those from the IV method. The results show that the thin Carmoisine azo dye layer decreases leakage current and defect-trapped charge density, enhancing the reliability and performance of the devices. This study contributes a new organic electronic material, Carmoisine dye, to the literature on semiconductor devices.
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