Abstract

Radiation-hardness of silicon (Si) has been the subject of interest due to the damage of the material-based detectors during and after operation. In this work, the effects of 4 MeV proton-irradiation on the electrical properties of devices fabricated on undoped and Fe-doped p-Si were investigated using current-voltage (I-V) and capacitance-voltage (C-V) techniques. A decrease in current and capacitance is less pronounced and the conduction mechanism remains unchanged on Fe-doped p-Si diode after proton-irradiation. This insignificant change of electrical parameters of the Fe-doped diode after proton-irradiation indicates the suppression of the radiation effect by Fe in Si. The electrical properties of the diode are less dependent on incident radiation, because of the possible prevention of further dislodgement of atoms by incident radiation. As a result, the material becomes resistant to radiation damage, making the electrical properties of the diode independent of incident radiation due to Fe atoms in Si. As a result of the ohmic behaviour displayed by the Fe-doped Si diode, it is possible that in Si, Fe is responsible for generation-recombination (g-r) centres, which are defect levels positioned at the middle of the energy gap of Si. The possibility of these defects being responsible for the suppression of the radiation effect is explained in this work, making Fe a promising dopant to improve the radiation-hardness of Si.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.