The results of kinetic modeling by the Monte Carlo method of sputtering heavy d-metals of Ir, Os, and W group by nitrogen N+ ions with energy in the range of 0.5–2.5 keV are presented. The coefficients of physical ion sputtering, the average sputtered atom energies, the reflection coefficients of the bombarding ions in the form of neutral nitrogen atoms, and the depth of ion penetration into the target were calculated. The calculations were performed for one-, two- and three-element targets, the partial ion sputtering coefficients of these metals were determined, and the influence of the surface binding energy on the ion sputtering parameters of individual target elements was studied. The calculations were performed for an Al target to compare the ion sputtering parameters of heavy d-metals and light aluminum. Despite the strong difference between the surface binding energy for these metals, their sputtering coefficients are of the same order of magnitude due to the fact that nitrogen ions penetrate deeper into aluminum and the exit of the recoil atoms from the target is impeded. The reflected or backscattered neutralized nitrogen atoms represent the second type of atomic particles emitted from the target. The coefficients of reflection of the bombarding nitrogen particles from the heavy metals and aluminum are determined.