Abstract
We report a low-temperature deposition of Al-O-N films in a wide range of compositions. We use and explain the advantages of reactive deep oscillation magnetron sputtering (leading to suppressed arcing on the Al target) with a pulsed reactive gas flow control and optimized reactive gas inlet position (leading to a very smooth composition control, despite the different reactivities of O2 and N2). Next, we focus on the relationships between film composition, structure and functional properties. We demonstrate a smoothly controlled refractive index at a very low extinction coefficient, and identify the Al-O-N composition leading to the highest hardness, elastic recovery and elastic strain to failure. We discuss some of the technological applications which these properties are useful for.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
