Abstract
ZnO thin films were deposited on glass substrate by Successive Ionic Layer Adsorption Reaction (SILAR) method. Effect of oxygen flow rate in textured grain growth, resistance and band gap of the thin films have been done. Textured grain growth of the samples were measured by comparing the peak intensities from XRD. Textured grain growth was found to be maximum when the oxygen flow rate is 2.5 litre/minute. It is found that as the oxygen flow rate increases above this limit, textured grain growth decreases and resistance the samples increases. The optical band gap of ZnO film was found to be increased with the increase of oxygen flow rate.
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