Abstract
Ion coating technology plays an important role in the modern information display field. The solution method process is still immature, but ion coating technology can be stable and efficient in the preparation of large-area films with good uniformity, which is beneficial to the actual industrial production. Thin-film transistors, which are the core of the driving circuit of the display in industrial production, are usually prepared by using magnetron sputtering technology as well as chemical vapor deposition (CVD) technology. The anode of organic light-emitting diode devices usually uses magnetron sputtering technology, and the cathode and organic light-emitting layer materials usually use vacuum vapor deposition technology, while the main preparation methods for the insulation layer include atomic layer deposition and magnetron sputtering. Throughout the preparation process of amorphous silicon thin-film transistors, the main coating technologies that are used include magnetron sputtering in ion coating technology and plasma-enhanced CVD. Ion coating technology information has already become the cornerstone technology of the display industry.
Published Version
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