Abstract In this work, β-Ga2O3 based Schottky barrier diodes (SBDs) with a composite termination structure of the ZnNiO thin alloy films are reported. β-Ga2O3 SBDs with the junction termination extension structure of the wide-bandgap p-type ZnNiO achieve a breakdown voltage (Vbr) of 2040 V and a specific on-resistance Ron,sp of 3.48 mΩ·cm2, contributing a power figure of merit (PFOM, Vbr2/Ron,sp) of 1.20 GW/cm2. Meanwhile, we demonstrated high-performance vertical β-Ga2O3 SBDs with the bevel junction termination extension (BJTE) structure, which the Ron,sp,Vbr and BFOM are 4.21 mΩ·cm2, 2704 V, and 1.74 GW/cm2, respectively. Technology computer aided design simulations show that BJTE structure significantly optimizes the surface electric field of β-Ga2O3 drift layer. These devices make a significant step to achieve high performance β-Ga2O3 power devices by implementing a composite termination structure.
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