A pre-buried mask method to fabricate suspended silicon microstructures by using pure wet etching in TMAH solution is presented in this paper. Pre-buried mask method adopts a common mask and a pre-buried mask before etching, greatly simplifies etching process, and also enables suspended silicon microstructures fabrication with finite thickness to be achieved by using pure wet etching. Pre-buried mask etching method can fabricate suspended silicon microstructures with arbitrary thickness in theory. The 40 μm thick suspended silicon beam-mass microstructures have been conducted on 500 μm thick silicon wafer by using pre-buried mask method, and a 60 μm thick suspended silicon beam-mass microstructures also have been fabricated on 500 μm thick silicon wafer for rocking mass micro-gyroscope to effectively improve Q-factors and sensitivity. Pre-buried mask etching method can also be widely used to fabricate various thin microstructures on thick silicon wafers and bulk silicon devices by using pure wet etching, especially for low-cost industrial applications.
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