The residual defect in pulse height defect in a silicon surface barrier detector (SSB) has been a theme of extensive studies. The residual defect was taken as recombinations of electrons and holes under a weak electric field strength(1). Although many works reported models of recombination, none of them could explain the dependences of the residual defect on bias voltage and on resistivity of SSB(2)(4).Recently, the author reported a model of dielectric effect of a plasma column(5). In this model, the residual defect was theoretically explained by a dielectric property of a plasma column, which was produced by an incident heavy ion. The residual defect is caused by an incomplete charge induction by electrons and holes inside the dielectric plasma column, which screens the movement of inner carriers. The model of dielectric effect included one parameter, called screening factor. The screening factor indicated the time averaged rate of screening carriers from positive and negative electrodes and were determined by experiments on the residual defect. With the experiments on the residual defect of many kind of charged particles, it was concluded that the screening factor was almost proportional to the density of electron-hole pairs of a plasma column(6). In this short note, a method of deducing heavy ion energy is proposed, first. Withthis method, the energy of heavy ion is estimated more accurately than before. Secondly, a feasibility of an SSB as a charged particle identifier is discussed. With one SSB, the atomic number and mass number of incident heavy ion are determined, provided that the screening factor is proportional to the electron-hole density of a plasma column.
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