The present study reports the improvement of piezoelectric properties of sputtered BiFeO3 films, and application to piezoelectric MEMS vibration energy harvesters (MEME-pVEHs). (100)-oriented BiFeO3 films were obtained on (100)-oriented LaNiO3 bottom electrodes grown on (100) Si substrates at deposition temperatures ranging from 450 °C to 550 °C. While all the films showed well-defined ferroelectric hysteresis loops at room temperature, the highest e31,f coefficient of −3.6 C/m2 was obtained at 500 °C. The increase of the e31,f coefficient with increasing of the Rayleigh constant indicates the domain wall substantially contributes to the piezoelectric properties of the BiFeO3 films. MEMS-pVEHs measuring 1 × 6 mm2 and Si proof mass of 3.0 mg were fabricated using the BiFeO3 film. The resonance frequency, electromechanical coupling factor, and mechanical quality factor were determined as 151.2 Hz, 0.1%, and 850, respectively. The maximum output power was 2.4 μW at 0.3 G, which is comparable with that of the best-performing MEMS-pVEHs using Pb(Zr,Ti)O3 films.
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