Useful analytical application of submicrometer band electrodes depends strongly upon developing reproducible, convenient fabrication and characterization procedures. We report fabrication of arrays of individually addressable submicrometer band electrodes that are 2 mm long and functional down to 37.0 nm in width, using multilayered materials and conventional microfabrication techniques. Fabrication involves thermal vapor deposition of a chromium adhesion layer and a gold layer on glass, followed by plasma-enhanced chemical vapor deposition of a silicon nitride layer, photolithography, and reactive ion etching. The topography of each layer was studied using contact-mode atomic force microscopy. Surfaces show larger features as the thickness of gold increases. Silicon nitride topography shows a relatively smoother surface, indicating that it may serve as a planarizing layer for subsequent gold layers. Cyclic voltammetry at 0.10 V/s of individual band electrodes in a solution of Ru(NH3)63+ shows a typical sigmoidal response, as would be expected when the diffusion layer exceeds the smallest dimension of the electrodes. At faster scan rates, peak-shaped voltammograms are observed, as expected. Good reproducibility of electrochemical behavior was obtained for electrodes in the same array.