We have fabricated two types of 1.5 μm light-emitting devices based on Er,O-codoped GaAs (GaAs:Er,O) using organometallic vapor phase epitaxy (OMVPE). In a device exhibiting a room-temperature lasing at the GaAs band-edge, the threshold current density increased with Er concentration. The Er intensity rose up steeply and then decreased gradually in the spontaneous emission region. In the stimulated emission region, it remained almost constant, reflecting ultrafast energy transfer to Er ions. In a device exhibiting a room-temperature lasing from strained GaInAs quantum wells (QWs) embedded in GaAs:Er,O, on the other hands, the lasing wavelength was designed to tune to the energy separation between the second excited states 4I11/2 and the ground state 4I15/2 of Er3+ ions. The Er intensity revealed initially steep increase with injected current density in the region for spontaneous emission from the GaInAs QWs. In the stimulated QW emission region, however, the intensity continued to increase with the current density.