We have investigated the tunneling magnetoresistance (TMR) effect and switching characteristics for magnetic tunnel junctions (MTJs) with amorphous ferromagnetic Co 75Si 15B 10 free layer compared to MTJs with Co 75Fe 25, Ni 80Fe 20 and Co 70.5Fe 4.5Si 15B 10 free layers. Since amorphous CoSiB had a low saturation magnetization ( M s=470 emu/cm 3) and a modest anisotropy constant ( K u=1500 erg/cm 3), the MTJ with this free layer showed better switching characteristics, especially CoSiB-based MTJ exhibited much lower switching field ( H sw=3 Oe) and interlayer coupling field ( H int=10 Oe) than MTJs with the other free layers, but TMR ratio showed relatively low value (23%). In addition, the bias voltage dependence of TMR ratio in CoSiB-based double MTJ was improved compared to that of single MTJ. It was expected that CoSiB was a potential candidate material as the free layer for use in high-density magnetic random access memory (MRAM) with an MTJ element.
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