This paper presents an analysis of the Step Field Plate Laterally Diffused Metal Oxide Semiconductor (SFP LDMOS) structure for improved high power and RF performance. The proposed structure is cost-effective, CMOS integrable, and has a high power figure of merit (FoM) due to its high off-state breakdown voltage (BVDS,off) and low specific on-resistance (Rsp). Significant improvement in frequency behavior is observed, as demonstrated by the flatter trans-conductance (gm), 12.5x lower gate-to-drain capacitance (Cgd), 2.5x lower gate-to-source capacitance (Cgs), and lower output conductance (gds). Single tone and double tone analyses are performed on an RF PA circuit implemented in TCAD. Results show ∼5 dBm higher output power (Pout), ∼6 dB higher power gain, and 46% higher drain efficiency (η), which are attributed to ∼1.9x lower drain-to-source capacitance (Cds) and ∼15 dBm lower magnitude of third-order intermodulation distortion due to lower third order derivative of drain current (ID). The paper also explains the device physics behind these observations.
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