Carbon films with flakelike geometry, exhibiting excellent electron field emission (EFE) properties were synthesized by a modified RF sputtering process, which used an Ar:CH4:H2 gas mixture, instead of a conventional Ar:H2 mixture. These films contain nanosized diamonds and allotropic phases (i-carbons and graphites) embedded in amorphous carbon films. The EFE process can be turned on at E0 = 4.83 V/µm, achieving an EFE current density of Je = 280 µA/cm2 at an 8 V/µm applied field. The EFE properties of these flakelike carbon films essentially do not change with processing parameters, indicating that these carbon films are more process-reliable and hence have better potential for application as electron field emitters.