Characteristics Of Field-effect Transistors Research Articles

Time-Dependent Field Effect in Three-Dimensional Lead-Halide Perovskite Semiconductor Thin Films.

Charge transport in three-dimensional metal-halide perovskite semiconductors is due to a complex combination of ionic and electronic contributions, and its study is particularly relevant in light of their successful applications in photovoltaics as well as other opto- and microelectronic applications. Interestingly, the observation of field effect at room temperature in transistors based on solution-processed, polycrystalline, three-dimensional perovskite thin films has been elusive. In this work, we study the time-dependent electrical characteristics of field-effect transistors based on the model methylammonium lead iodide semiconductor and observe the drastic variations in output current, and therefore of apparent charge carrier mobility, as a function of the applied gate pulse duration. We infer this behavior to the accumulation of ions at the grain boundaries, which hamper the transport of carriers across the FET channel. This study reveals the dynamic nature of the field effect in solution-processed metal-halide perovskites and offers an investigation methodology useful to characterize charge carrier transport in such emerging semiconductors.

Structural Odd–Even Effect Impacting the Dimensionality of Transport in BTBT‐CnOH Organic Field Effect Transistors

AbstractThe synthesis and characterization of a series of [1]benzothieno[3,2‐b][1]benzothiophene (BTBT) molecules disubstituted by hydroxy aliphatic chains in positions 2 and 7 (BTBT‐CnOH), where the intralayer molecular stacking alternates between a classical and an inverted herringbone mode as a function of whether the alkyl sides chains have an even or an odd number of carbon atoms are reported. This odd–even effect does not only affect the interlayer distance of the lamellar structures and the melting points, but also the electronic properties. The BTBT‐CnOH odd series develops a classical herringbone pattern with edge‐to‐edge S⋯S interaction chains linked together by face‐to‐edge S⋯S interaction chains with 2D mobility. However, the even series has only edge‐to‐edge interactions in an inverted herringbone organization and thus only a 1D conducting character. These two types of herringbone patterns have different field effect transistor characteristics and mobilities, those of the odd members being systematically higher than their even neighbors. This is the first example of an odd–even effect impacting the electronic properties of an organic semiconductor.

Simulation studies on electrical characteristics of silicon nanowire feedback field-effect transistors with interface trap charges

In this study, we examine the electrical characteristics of silicon nanowire feedback field-effect transistors (FBFETs) with interface trap charges between the channel and gate oxide. The band diagram, I–V characteristics, memory window, and operation were analyzed using a commercial technology computer-aided design simulation. In an n-channel FBFET, the memory window narrows (widens) from 5.47 to 3.59 V (9.24 V), as the density of the positive (negative) trap charges increases. In contrast, in the p-channel FBFET, the memory window widens (narrows) from 5.38 to 7.38 V (4.18 V), as the density of the positive (negative) trap charges increases. Moreover, we investigate the difference in the output drain current based on the interface trap charges during the memory operation.

Electrical Detection of Molecular Transformations Associated with Chemical Reactions Using Graphene Devices.

This study proposes a method to electrically detect chemical reactions that involve bond changes through reactions on graphene surfaces. To achieve a highly sensitive detection, we focused on the thiol-ene reaction that combines the maleimide and thiol groups. Graphene field-effect transistors (FETs) were used to detect the binding changes of the modified molecules. Graphene has high carrier mobility and is sensitive to changes in the electronic state of its surface. Graphene has been used as a sensor to detect low-concentration targets with high sensitivity. N-(9-Acridinyl)maleimide (NAM) was chosen as the modified molecule to immobilize maleimide on graphene through π-interaction, and methanethiol (MeSH) was set as the target thiol. The modification of NAM to graphene was first confirmed by attenuated total reflection Fourier transform infrared spectroscopy, and the modification density was 0.5 ± 0.1/nm2 through cyclic voltammetry. Owing to a bond exchange, the transfer characteristics of the graphene FET shifted by 2 V to the negative direction after being exposed to MeSH at 10 parts per billion (ppb), equivalent to 0.2 ng, under ultraviolet irradiation. With 5000 ppb of acetic acid, it only shifted 0.7 V. With 1000 ppb of ethanol and 10,000 ppb of methanol, it shifted to the positive direction by 0.4 and 0.6 V, respectively. Because the nontarget molecule showed only a slight response, a thiol-ene chemical reaction was detected. The proposed method can detect the bond-change reaction using an ultralow concentration of MeSH, which indicates that at least 10 ppb (or 0.2 ng) of MeSH was detected by the graphene FET.

Effect of interfacial conductivity on electrical characteristics of negative capacitance field effect transistors

In this article, an interfacial conductivity model for the surface potential and the drain current was proposed based on the metal-interface-ferroelectric-insulator-semiconductor (MIFIS) structure negative capacitance field effect transistor (NC-FET). The simulating results illustrate that the electrical conductivity (σ) of the interface layer between the electrode and ferroelectric thin film caused by lattice misfit plays an important role in the process of voltage amplifying and steep switching for the NC-FET. It is indicated that new device design rules should take into account this scenario.

Polarity Control and Weak Fermi-Level Pinning in PdSe2 Transistors.

Two-dimensional (2D) materials have been considered key materials for the future logic devices due to the excellent electrostatic integrity originating from their ultrathin nature. However, the carrier polarity control of 2D material field-effect transistors (FETs) still remains a challenging issue, hindering the realization of complementary logic function in the 2D material platform. Here, we report a comprehensive study on the electrical characteristics of PdSe2 FETs with different metal contacts. It is found that the carrier polarity in PdSe2 FETs can be modulated simply by changing the metal contact due to the weak Fermi-level pinning in PdSe2. We demonstrate a complementary metal-oxide-semiconductor (CMOS) inverter using the same channel material PdSe2 for n- and p-MOSFETs but with different metal contacts, suggesting the possible realization of PdSe2-based CMOS logic circuits.

Black Phosphorus—Diketopyrrolopyrrole Polymer Semiconductor Hybrid for Enhanced Charge Transfer and Photodetection

Black phosphorus (BP) has emerged as an exciting 2D material for optics, photonics, and electronics. However, there are few studies on BP in terms of modulation and enhancement of their electronic and optical properties and their concurrent reactivity and hence reduction after exposure to the ambient environment. To resolve such challenges, creating inorganic–organic hybrid materials is a suitable approach that offers significant opportunities to enhance the utility of BP by combining them with an organic material which has a complementary set of properties. Herein, a hybrid‐layered BP material coupled with a low bandgap donor–acceptor organic semiconducting polymer, selenophene‐flanked diketopyrrolopyrrole with thienyl‐vinylene‐thienyl (PDPPSe–TVT) is reported, to broaden the optical absorption and tune the ambipolar field effect transistor characteristics. A highly sensitive, nongated broadband photodetection capability of the hybrid device with a detection range from UV–vis to near‐IR (280–1050 nm) and responsivities of up to 4.22 × 103 A W−1 in ambient conditions. In addition to improved photodetection, simultaneous enhancement in both hole (71%) and electron (91%) mobilities is achieved while protecting the sensitive BP material from rapid environmental degradation. The findings therefore report a breakthrough in enhancing the utility of BP as a light‐active material for versatile photonics and electronics applications without operating in an inert environment.

Charge-Transfer Effect and Enhanced Photoresponsivity of WS2- and MoSe2-Based Field Effect Transistors with π-Conjugated Polyelectrolyte

The characteristics of field effect transistors (FETs) fabricated using two-dimensional (2D) transition-metal dichalcogenides (TMDCs) can be modulated by surface treatment of the active layers. In this study, an ionic π-conjugated polyelectrolyte, poly(9,9-bis(4'-sulfonatobutyl)fluorene-alt-1,4-phenylene) potassium (FPS-K), was used for the surface treatment of MoSe2 and WS2 FETs. The photoluminescence (PL) intensities of monolayer (1L)-MoSe2 and 1L-WS2 clearly decreased, and the PL peaks were red-shifted after FPS-K treatment, suggesting a charge-transfer effect. In addition, the n-channel current of both the MoSe2 and WS2 FETs increased and the threshold voltage (Vth) shifted negatively after FPS-K treatment owing to the charge-transfer effect. The photoresponsivity of the MoSe2 FET under light irradiation (λex = 455 nm) increased considerably, from 5300 A W-1 to approximately 10 000 A W-1, after FPS-K treatment, and similar behavior was observed in the WS2 FET. The results can be explained in terms of the increase in electron concentration due to photogating. The external quantum efficiency and photodetectivity of both FETs were also enhanced by the charge-transfer effect resulting from surface treatment with FPS-K containing mobile cations (K+) and fixed anions (SO3-), as well as by the photogating effect. The variation in charge-carrier density due to the photogating and charge-transfer effects is estimated to be approximately 2 × 1012 cm-2. The results suggest that π-conjugated polyelectrolytes such as FPS-K can be a promising candidate for the passivation of TMDC-based FETs and obtaining enhanced photoresponsivity.

Transient performance analysis of graphene FET gated via ionic solid by numerical simulations based on tight-binding method and Nernst–Planck–Poisson equations

We investigate the electrical transport characteristics of graphene channel field-effect transistors (FETs) gated via ionic solid (IS), where the conventional gate insulator, such as SiO2, has been replaced by solid electrolytes, such as LiP3O4. In this study, we focus on (i) the gate controllability of the current in comparison to conventional graphene FETs with SiO2 as an insulating material and (ii) the transient characteristics of the drain current and time required to switch on the current. We employ the tight-binding formalism and Boltzmann equation to calculate the electronic band structure and the electronic transport in graphene, while the Nernst–Planck–Poisson equations have been employed to calculate the time-dependent charge distribution in solid electrolytes and the resulting electric double layer formation at the graphene/IS and IS/gate interfaces. Our simulations have shown that graphene FET gated via IS shows superior gate controllability more than SiO2-gated graphene FET with the insulator thickness of 1 nm, and the saturated drain current is insensitive to the IS thickness. Moreover, the time required to switch on the drain current is proportional to the thickness of IS, and the limited number of Li+ ion vacancies in IS is preferable in obtaining faster switching than the case of unlimited vacancy cases while keeping the superior gate controllability.

Gamma-radiation Induced Degradation of the Electrical Characteristics of NMOSFETs

In this paper, we present the gamma-radiation induced degradation of the electrical characteristics of N-channel Metal Oxide Semiconductor Field Effect Transistors (NMOSFETs). The exposure was done with a 60Co gamma-ray source over the total dose range of 1 kGy to 10 kGy, with a dose rate of 3.9 kGyhr. The effects of irradiation induced degradation on device parameters such as threshold voltage, low field mobility, device transconductance (Gm), saturation drain current, off state leakage current and subthreshold swing were investigated. The threshold voltage was determined using the linear extrapolation method. The device dimensions with Wide/Long channel that excluded the Narrow Channel Effect (NCE) and the Short Channel Effect (SCE) were measured. The results showed that the threshold voltage, device transconductance and low field mobility decreased but the saturation drain current, off state leakage current and subthreshold swing increased as the gamma irradiation increased. Finally, the macro parameter models were investigated and discussed.

Theoretical Study of Current-Voltage Characteristics of Electron-Hole Bilayer Tunnel Field Effect Transistors of Different Channel Semiconductors

Theoretical Study of Current-Voltage Characteristics of Electron-Hole Bilayer Tunnel Field Effect Transistors of Different Channel Semiconductors

A Schrödinger–Poisson model for output characteristics of trigate ballistic Si fin field effect transistors (FinFETs)

AbstractThis article presents a Schrödinger–Poisson based technique to predict characteristics of trigate Si fin field effect transistors (FinFETs). The channel characteristics are modeled by a three‐dimensional (3D) Schrödinger wave equation considering quantum‐mechanical ballistic transport. Using a nonequilibrium green function and a 3D Poisson equation, drain current associated with source‐drain Fermi energy difference is evaluated. Contact resistance and its impact on the drain current is adjusted using a modeled parameter in Fermi‐Dirac distribution function. It is observed that the drain current as a function of drain bias saturates because of the finite carrier supply from the source electrode. The model is calibrated using TCAD simulations for quantum transport. To validate the proposed model, output and transfer characteristics of nanoscale FinFETs are compared with experimental data and a good degree of accuracy is observed. It has been demonstrated that the proposed model has the ability to predict FinFETs characteristics having .

Bulk versus Contact Doping in Organic Semiconductors.

This study presents a comparative theoretical analysis of different doping schemes in organic semiconductor devices. Especially, an in-depth investigation into bulk and contact doping methods is conducted, focusing on their direct impact on the terminal characteristics of field-effect transistors. We use experimental data from a high-performance undoped organic transistor to prepare a base simulation framework and carry out a series of predictive simulations with various position- and density-dependent doping conditions. Bulk doping is shown to offer an overall effective current modulation, while contact doping proves to be rather useful to overcome high-barrier contacts. We additionally demonstrate the concept of selective channel doping as an alternative and establish a critical understanding of device performances associated with the key electrostatic features dictated by interfaces and applied voltages.

Impact of the channel length on molybdenum disulfide field effect transistors with hafnia-based high-k dielectric gate

Field effect transistors (FETs) using two-dimensional molybdenum disulfide (MoS2) as the channel material has been considered one of the most potential candidates for future complementary metal-oxide-semiconductor technology with low power consumption. However, the understanding of the correlation between the device performance and material properties, particularly for devices with scaling-down channel lengths, is still insufficient. We report in this paper back-gate FETs with chemical-vapor-deposition grown and transferred MoS2 and Zr doped HfO2 ((Hf,Zr)O2, HZO) high-k dielectric gates with channel lengths ranging from 10 to 30 µm with a step of 5 µm. It has been demonstrated that channels with the length to width ratio of 0.2 lead to the most superior performance of the FETs. The MoS2/HZO hybrid FETs show a stable threshold voltage of ∼1.5 V, current on/off ratio of >104, and field effect mobility in excess of 0.38 cm2 V−1 s−1. The impact of the channel lengths on FET performance is analyzed and discussed in depth. A hysteresis loop has been observed in the Ids − Vgs characteristics of the hybrid FETs, which has been further studied and attributed to the charge effect at the interfaces. The HZO films show a relatively weak ferroelectric orthorhombic phase and thus serve mainly as the high-k dielectric gate. Charge trapping in the HZO layer that might induce hysteresis has been discussed. Our results show that MoS2/HZO hybrid FETs possess great potential in future low power and high-speed integrated circuits, and future work will focus on further improvement of the transistor performances using ferroelectric HZO films and the study of devices with even shorter MoS2 channels.

Investigation of transport in edge passivated armchair silicene nanoribbon field effect transistor by ab-initio based Wannierised tight binding

In this work, comparative analysis of hydrogen(H), hydroxyl (OH), fluorine (F) and chlorine (Cl) edge passivated silicene nanoribbon (SiNR) field effect transistors (FETs) having nanoribbon width of 7 dimers along the armchair direction has been carried out. The ab-initio tight binding simulations of SiNR with different edge passivation uses the multi-scale approach which consists of density functional theory , Wannier function based tight binding and the non-equilibrium Green's Function formalism. It has been found that, the band gap of hydrogen passivated SiNR is comparatively larger than the other edge passivated SiNRs. To choose the optimum number of Wannier functions for tight binding approximations, the contribution of orbitals has also been analyzed. It has been found that, in transport characteristics of X-edge passivated SiNR FETs (X is H, F, Cl and OH), the H-edge passivated SiNR FET shows improved transfer characteristics in comparison to OH, Cl and F–edge passivated SiNR FETs. • Performance analysis of various edge passivated Silicene armchair nanoribbon. • Bandgap of H-passivated SiNR is higher than OH, Cl and F–edge passivated SiNR. • Use of projected density of states to choose the optimum number of Wannier function. • Higher I ON / I OFF in case of H-passivated SiNR FET in comparison other–edge passivated SiNR FET. • Performance of H-passivated SiNR FET is superior among other–edge passivated SiNR FET.

Solution-Processed Organic and ZnO Field-Effect Transistors in Complementary Circuits

The use of high κ dielectrics lowers the operating voltage in organic field-effect transistors (FETs). Polymer ferroelectrics open the path not just for high κ values but allow processing of the dielectric films via electrical poling. Poled ferroelectric dielectrics in p-type organic FETs was seen to improve carrier mobility and reduce leakage current when compared to unpoled devices using the same dielectric. For n-type FETs, solution-processed ZnO films provide a viable low-cost option. UV–ozone-treated ZnO films was seen to improve the FET performance due to the filling of oxygen vacancies. P-type FETs were fabricated using the ferroelectric polymer poly(vinylidene fluoride-trifluoroethylene) (PVDF-TrFE) as the dielectric along with a donor–acceptor polymer based on diketopyrrolopyrrole (DPP-DTT) as the semiconductor layer. The DPP-DTT FETs yield carrier mobilities upwards of 0.4 cm2/Vs and high on/off ratios when the PVDF-TrFE layer is electrically poled. For n-type FETs, UV–ozone-treated sol–gel ZnO films on SiO2 yield carrier mobilities of 10−2 cm2/Vs. DPP-DTT-based p- and ZnO-based n-type FETs were used in a complementary voltage inverter circuit, showing promising characteristic gain. A basic inverter model was used to simulate the inverter characteristics, using parameters from the individual FET characteristics.

Use of doping to achieve low contact resistance in bottom-gate top-contact type organic transistor with liquid-crystalline organic semiconductor, Ph-BTBT-10

We have investigated the characteristics of bottom-gate and top-contact type field effect transistors fabricated with polycrystalline thin films of a liquid-crystalline organic semiconductor, 2-decyl-7-phenyl-benzothienobenzothiophene (Ph-BTBT-10), with a p-type dopant, tetrafluoro-tetracyano-quinodimethane (F4-TCNQ). We found that the contact resistance between the semiconductor and electrode was reduced from 3.0 kΩ cm to 1.2 kΩ cm by contact doping with F4-TCNQ, and to 0.9 kΩcm by subsequent thermal annealing of the films, in which the F4-TCNQ dopant diffused from the surface to the interior of the Ph-BTBT-10 thin film. In addition, we found that contact-doped and thermally annealed devices showed higher mobility and smaller threshold voltage in short-channel devices compared to pristine devices. We conclude that thermal diffusion of dopants to improve FET performance is an important technique.

Effect of Buffer Layer Capacitance on the Electrical Characteristics of Ferroelectric Polymer Capacitors and Field Effect Transistors.

We demonstrated the effect of a buffer layer on the electrical characteristics of ferroelectric polymer capacitors and field-effect transistors. Various polymer materials with a dielectric constant between 2 and 42 were used to form buffer layers with a similar thicknesses, but with different capacitances. In order to evaluate the characteristics of the ferroelectrics with a buffer layer, the polarization–voltage characteristics of the capacitor, the transfer characteristics, and the retention characteristics of the transistors were investigated. As the capacitance of the buffer layer increased, high remnant polarization (Pr), high hysteresis, and long retention times were observed. Exceptionally, when poly(methylmethacrylate) and rigid poly(aryl ether) (poly(9,9-bis(4-hydroxyphenyl)fluorene-co-decafluorobiphenyl)) were used as the buffer layer, Pr had a value close to 0 in the dynamic measurement polarization–voltage (P–V) characteristic, but the quasi-static measurement transfer characteristic and the static measurement retention characteristic showed relatively high hysteresis and long retention times. Our study provides a scientific and technical basis for the design of ferroelectric memory and neuromorphic devices.

Band offsets, dielectric dispersion and some applications of CdSe/GeO2 heterojunctions

Herein, the formation, structural, morphological, compositional, optical, dielectric, photoelectrical and electrical properties of the CdSe/GeO2 heterojunctions are explored. While the surface displayed formation of deficient GeO, the bulk of the films exhibited correct stoichiometry of GeO2 and CdSe. It is found that stacking of GeO2 onto CdSe enhances the crystallinity of CdSe by reducing the defects concentrations. It blue shifts the energy band gap of CdSe from 1.74 eV to 2.60 eV. The stacked layers of CdSe/GeO2 displayed conduction and valence band offsets of 2.34 eV and 1.23 eV, respectively. In addition, the Drude-Lorentz model analyses have shown that the coating of GeO2 onto CdSe, highly increases the drift mobility of charge carriers and tunes the plasmon frequency making it more appropriate for optoelectronic device applications. When exposed to light irradiation, an illumination intensity dependent photosensitivity is observed. The photoconduction mechanism is governed by the sublinear recombination with exponential trap distribution. Moreover, the capacitance –voltage characteristics of the device revealed metal-oxide-semiconductor field effect transistors (MOSFET) characteristics. The built in potential for this device under reverse biasing conditions reached 4.74 eV.

Electrically Tunable Room Temperature Hysteresis Crossover in Underlap MoS2 Field-Effect Transistors.

Clockwise to anticlockwise hysteresis crossover in current-voltage transfer characteristics of field-effect transistors (FETs) with graphene and MoS2 channels holds significant promise for nonvolatile memory applications. However, such crossovers have been shown to manifest only at high temperature. In this work, for the first time, we demonstrate room temperature hysteresis crossover in few-layer MoS2 FETs using a gate-drain underlap design to induce a differential response from traps near the MoS2-HfO2 channel-gate dielectric interface, also referred to as border traps, to applied gate bias. The appearance of trap-driven anticlockwise hysteresis at high gate voltages in underlap FETs can be unambiguously attributed to the presence of an underlap since transistors with and without the underlap region were fabricated on the same MoS2 channel flake. The underlap design also enables room temperature tuning of the anticlockwise hysteresis window (by 140×) as well as the crossover gate voltage (by 2.6×) with applied drain bias and underlap length. Comprehensive measurements of the transfer curves in ambient and vacuum conditions at varying sweep rates and temperatures (RT, 45 °C, and 65 °C) help segregate the quantitative contributions of adsorbates, interface traps, and bulk HfO2 traps to the clockwise and anticlockwise hysteresis.