Abstract

The conductivities of n-type inversion layers in (100) surfaces of p-type silicon were measured extensively as functions of electron density in the inversion layer, the ambient temperature and the applied magnetic field. Measurements were made on the carefully fabricated four “classes” of MOS field-effect transistors whose maximum mobilities at 4·2K were 14,000, 8000, 6800 and 1500 cm 2/V·sec, respectively. From the temperature dependence of the mobility, dominant momentum scattering was reasonably ascribed to surfon at 100 ∼ 300 K. and degenerate or non-degenerate coulomb scattering at lower temperatures as treated by Stern and Howard. From the curves of conductivity vs temperature at low temperatures and low electron concentration for specimens with high mobilities, an activation energy of 1·2 meV, relating to the shallow bound states associated with the lowest electrin sub-band, was observed. The conductivity σ xx of the inversion layer in a strong transverse magnetic field showed behaviors like those of completely free electrons without effects belonging to its material in its oscillation pattern. That is, the peak value of σ xx as a function of the gate voltage V R dependend only on the Landau index. The σ xx as a function of the magnetic field H at a constant V R showed a similar Shubnikov-de Haas (SdH) type oscillation to that of three dimensional one. The SdH oscillation gave an “apparent” g-value g* which ranges from 2 to 5 depending on the surface carrier density n s , due to the change in the ratios of the widths of the Landau levels to the level separation. The “reasonable” g-value of the conduction electrons in the inversion layer has been determined using a modified tilted magnetic field method. The g-value at the fixed magnetic field was independent of surface carrier density n s and tended to 2 in the extreme strong magnetic field. Discussion is made of the g-value relating to the Landau level width and the energy gaps in the density of states under strong magnetic field.

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