Surface state related [formula omitted] noise in MOS transistors

Abstract

The theory of surface state effects on 1 ƒ noise in p− n junctions is extended to explain low-frequency excess noise in MOS transistors. Experimental results are critically compared to theory. The results show that low-frequency excess noise in MOS transistors is due to the fluctuation of charge density in the conduction channel caused by the surface potential fluctuation. The fluctuation of the surface potential is introduced by the random charge occupancy of surface states. The low-frequency excess noise in MOS transistors is found to be proportional to the surface state density and the square of the transconductance of the device, and inversely proportional to the gate area and the square of the unit area gate-insulator capacitance. It is also shown that the surface state density when the surface is strongly inverted can be obtained from noise measurements. Finally it is shown that by proper heat treatment it is possible to reduce the low-frequency excess noise of MOS transistors.