Abstract

In this work, a comprehensive evaluation was performed for negative capacitance FinFET (NC-FinFET) based static random access memory (NC-SRAM) using the calibrated current-voltage relationship and dynamic behavior of NC-FinFETs that were experimentally demonstrated at 14-nm technology node. Important performance indicators of SRAM including static noise margin and standby leakage power were assessed at different values of supply voltage (V DD ). Compared with the conventional FinFET-based SRAM, it was found that NC-SRAM shows different behaviors at high V DD and low V DD . For example, at low V DD , standby leakage power consumption of NC-SRAM is higher than conventional SRAM which is different from the conclusion drew by previous works when only high V DD case was considered. Our evaluation gives new insights on the design of future NC-FinFET-based SRAMs, particularly with extremely low supply voltage.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.