Abstract
The synthesis of diamond at low pressure using Hot Filament Chemical Vapor Deposition (HFCVD) method has received significant attention in recent years for the unique characteristics of diamond. Among various input parameters, chamber pressure plays an important role in controlling nucleation, growth and morphology of coating. In this investigation, the morphology of diamond was analyzed after (1) pretreatment with acid, (2) pretreatment with acid and without diamond seeding and (3) pretreatment with acid and seeding. Keeping other input parameters constant the chamber pressure varied from low pressure (0.133kPa) to high pressure (6.666kPa). The variation of the crystal size with different input parameters were studied with Scanning Electron Microscope (SEM) micrographs and Raman spectroscopy. It was observed that cobalt inhibited diamond growth on the received carbide insert. Pretreatment with acid without seeding has improved diamond morphology. The pretreatment with acid and diamond powder seeding has improved diamond coating significantly.
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