Abstract
Nano-crystalline diamond films were successfully deposited using CH 4/H 2/Ar gas mixture by hot filament chemical vapor deposition (HFCVD) method. The characterizations of the as-grown films are carried out by using field emission scanning electron microscopy (FE-SEM) and high-resolution transmission electron microscopy (HR-TEM). The results show that the film consists of nano-crystalline diamond grains with sizes ranging from 4 to 30 nm. High renucleation rates are found and attributed to the formation of these nano-diamond grains. The roles that Ar plays in HFCVD system are discussed.
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