Abstract
Various carbon thin films synthesized by the hot filament chemical vapor deposition (CVD) method with various methane concentrations in hydrogen (1.0-12.5 vol.%) and temperatures of Si substrate (770-1000°C) were characterized by X-ray-absorption near-edge structure (XANES) and Raman spectroscopies as well as by scanning electron microscopy (SEM) and X-ray diffraction. Based on these results, the structural change of carbon thin films is deduced as a function of methane concentration and substrate temperature. Comparison between the Raman and XANES spectra demonstrates the usefulness of XANES spectroscopy for the characterization of carbon thin films and the complementary character between these spectroscopies.
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