Abstract
Metalorganic chemical vapor deposition (MOCVD) has been established as the most favoured method for the processing of (Ba, Sr)TiO3, Pb(Zr, Ti)O3 and SrBi2Ta2O9 thin films. Due to good step coverage, uniformity of thickness and composition as well as throughput MOCVD will certainly be the choice for the mass production of future electroceramic thin film based devices such as volatile and non-volatile memories, electrooptic devices, microactuators and sensors. Since many groups showed in a laboratory scale that electroceramic thin films deposited by MOCVD techniques are suitable for future applications in terms of electrical and mechanical properties, the need for production worthy tools is rapidly increasing. In this paper we present a large scale manufactor tool (capacity up to 4 × 300 mm) which meets all demands for an automized mass production of electroceramic thin films.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
