Abstract
Polycrystalline Pb(Zr, Ti)O3 thin films have been grown by Metalorganic Chemical Vapor Deposition (MOCVD) technique. The characterization of 200 nm thick polycrystalline Pb(Zr, Ti)O3 thin films on 6 inch diameter Pt/Ti/SiO2/Si substrates is reported. XRD reveals good crystalline structure with respect to powder standards. Ellipsometry indicates an interface layer due to substrate roughness induced by the heating-up procedure prior to growth. Ellipsometry is a good tool to evaluate the quality of the grown thin films and the thickness of this observed interfacial layer.
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