Abstract
This chapter demonstrates the nucleation density of diamond. To make a continuous diamond film within one hour or so under the chemical vapor deposition (CVD) conditions, a nucleation density of ≥108 cm -2 is necessary. To achieve this, the Si surface is scratched with diamond powder or paste. The powder size is usually 0.1–30 μm. The nucleation density is increased to approximately 108 cm -2 by this treatment. Alternatively, the Si wafer is ultrasonically treated in alcohol with diamond powder suspension for several minutes. The nucleation density can be increased to 109–1011 cm -2 by this treatment. In both cases, the Si surface is roughened. There are two possibilities on the creation of nucleation sites by scratching. The first possibility is a creation of micro edges of Si by scratching or the ultrasonic treatment of the Si surface, as it is known that diamonds tend to nucleate on sharp edges. The second possibility is the embedded diamond nanoparticles or fragments below the Si surface during the polishing or the ultrasonic treatments.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
