Abstract
Arsenic dimers and multilayers are shown to exist on (001)GaAs surfaces under atmospheric pressure (AP) organometallic chemical vapor deposition (OMCVD) conditions. We obtained reflectance-difference spectra from surfaces in AP H2 that are equivalent to those obtained from the (2×4) and disordered-c(4×4) reconstructions prepared in ultrahigh vacuum by molecular beam epitaxy. Implications for models of OMCVD growth.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
