In the current scenario of semiconductor technologies, the researchers are investigating the cylindrical Silicon-on-Insulator Schottky Barrier (SOISB) Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET) due to its enhanced analog/RF parameters, high ION /IOFF ratio and reduced ambipolarity. This study presents an analytical model for the cylindrical SOISB MOSFET, specifically focusing on how to calculate surface potential, threshold voltage, and drain current. Further, the research explores how altering the radius of the concentric SiO2 insulator pillar impacts the MOSFETs performance in analog/RF circuit applications. The Silvaco 3D device simulator has been used for conducting the numerical simulations for a channel length of 22nm and a silicon radius of 5nm. The SiO2 insulator pillar radius has been varied from 1nm to 4nm and its effect on the device characteristics has been investigated. The results show improved changes in analog/RF parameters and linearity, providing valuable insights for advanced semiconductor technologies.
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