The transport of two-dimensional electrons in a silicon inversion layer is determined by Monte Carlo simulation in the temperature range 4.2–40 K, where the electrical quantum limit occurs and only the lowest subband is populated. Two scattering mechanisms are taken into account: scattering by distant ionized impurities and scattering by surface roughness elements, along with their dependence on the polarizability of the two-dimensional electron gas. The mobility and coefficient of warm electrons in weak electric fields are calculated. The data are compared with previously published results.