International Journal of Computational Engineering ScienceVol. 04, No. 03, pp. 699-702 (2003) Poster PapersNo AccessNANOMETER-SCALE PATTERNING ON TITANIUM THIN FILM WITH LOCAL OXIDATION OF SCANNING PROBE MICROSCOPEJENG T. SHEU, CHENG C. CHEN, SUN P. YEH, and HSEIH T. CHOUJENG T. SHEUDepartment of Electrical Engineering, National Chi Nan University, No. 1, University Rd., Puli, Nantou 545, Taiwan, R.O.C. Search for more papers by this author , CHENG C. CHENDepartment of Electrical Engineering, National Chi Nan University, No. 1, University Rd., Puli, Nantou 545, Taiwan, R.O.C. Search for more papers by this author , SUN P. YEHDepartment of Electrical Engineering, National Chi Nan University, No. 1, University Rd., Puli, Nantou 545, Taiwan, R.O.C. Search for more papers by this author , and HSEIH T. CHOUDepartment of Electronic Engineering, National Yunlin University of Science and Technology, 123, University Road., Section 3, Touliu , Yunlin 640, Taiwan, R.O.C. Search for more papers by this author https://doi.org/10.1142/S1465876303002088Cited by:0 PreviousNext AboutSectionsPDF/EPUB ToolsAdd to favoritesDownload CitationsTrack CitationsRecommend to Library ShareShare onFacebookTwitterLinked InRedditEmail AbstractNanometer-scale oxidized patterns were fabricated on titanium (Ti) films deposited on silicon wafer using atomic force microscope (AFM) based field-induced oxidation process. Titanium surfaces can be oxidized at room temperature under ambient conditions with the tip of an atomic force microscope when applying a negative bias voltage between surface and tip. We investigated that the size of oxide patterns was dependant on tip-bias voltages, scanning speed, and relative humidity. We found that the attainable oxide features of titanium patterns were improved by increasing the scanning speed, tip-bias voltage and also by lowering the relative humudity. Fabrication of nanometer-scale structures on the Ti-metal film by AFM-based field-induced oxidation and subsequent chemical wet etching of the titanium in a dilute hydrofluoric aid (HF) was demonstrated. Patterns of Ti lines below 100nm in width successfully fabricated by the above-described method.Keywords:Titaniumatomic force microscopefield-induced oxidationnanometer-scale structures References C. R. K. Marrian and E. S. Snow, Microelectronic Engineering 32, 173 (1996). Crossref, Google ScholarE. S. Snow, P. M. Campbell and B. V. Shanabrook, Appl. Phys. Lett. 63, 3488 (1993). Crossref, Google ScholarJ. A. Dagataet al., Appl. Phys. Lett. 56, 2001 (1990). Crossref, Google ScholarE. S. Snow and P. M. Campbell, Appl. Phys. Lett. 64, 1932 (1994). Crossref, Google ScholarH. Sugimuraet al., Jpn. J. Appl. Phys., Part 2 32, L553 (1993). Crossref, Google ScholarE. S. Snow, D. Park and P. M. Campbell, Appl. Phys. Lett. 69, 269 (1996). Crossref, Google ScholarD. Wang, L. Tsau and K. L. Wang, Appl. Phys. Lett. 67, 1295 (1995). Crossref, Google ScholarT. Thundatet al., J. Vac. Sci. Technol. A8, 3537 (1990). Google ScholarK. Matsumoto, Proceedings of the IEEE 85, 612 (1997). Crossref, Google ScholarR. Heldet al., Physical E 2, 748 (1998). Crossref, Google Scholar FiguresReferencesRelatedDetails Recommended Vol. 04, No. 03 Metrics History KeywordsTitaniumatomic force microscopefield-induced oxidationnanometer-scale structuresPDF download