Substrate Rotation Speed Research Articles

EFFECTS OF THE SUBSTRATE ROTATION SPEED ON THE STRUCTURE AND UNIFORMITY OF YSZ COATINGS FABRICATED BY ELECTRON-BEAM SYNTHESIS IN THE FOREVACUUM PRESSURE RANGE

We present the experimental results on electron-beam deposition of Y<sub>2</sub>O<sub>3</sub>-stabilized zirconium dioxide ceramic coatings using a forevacuum plasma-cathode electron source. The coating thickness was found to decrease from 44 ± 12 μm to 16 ± 1 μm with increasing substrate rotation speed from 0 to 20 revolutions per minute, while the relative error of non-uniformity decreased from ε = 28% to ε = 6%. The coating structure exhibited inter-crystalline pores owing to the "shadow effect." Data on the coating porosity were obtained using scanning electron microscopy, and it was shown that the porosity increased with increasing rotation speed.

Martensitic phase mechanism of ternary FeCrMn thin films influenced by the substrate rotation speeds: structural and magnetic properties

In order to investigate the martensitic phase mechanism of the ternary FeCrMn thin films sputtered under the effect of substrate rotation speeds, the structural and related magnetic properties were studied. A range of thin films were deposited at varying rotational speeds of 0, 15, 30, and 45 rpm on flexible amorphous polymer substrates through the use of DC magnetron sputtering. The films were 50 nm thick and were produced at 0.09 nm s−1. The crystal structures showed that all films have a mixture of the body-centred tetragonal (bct) and tetragonal structure. The peak intensity of bct (110) martensitic α’phase increased with the increase of the rotation speeds whereas the tetragonal (430) and (333) peaks stayed almost stable. And, the morphologic surface analysis displayed that the smooth surface turned into a rough surface with the increase of the rotation speeds. After the measurements of hysteresis loops, the films obtained by sputtering of austenitic target have ferromagnetic character with increasing saturation magnetization, MS and coercivity, HC as the substrate rotation speeds increase. With increasing rotation speeds, the increase of the MS from 148 to 242 emu cm−3 and the rise of the HC of the films from 21 to 185 Oe might be explained by the increase of the grain sizes with the increase of % martensitic α’phase caused by increasing rotation speeds. The ternary FeCrMn thin films exhibit increasing % martensitic α’phase and corresponding ferromagnetic properties with increasing substrate rotation speeds. It is concluded that the nanostructured films of FeCrMn have different properties from those of their bulk counterparts under the influence of substrate rotation speeds. Therefore, the martensitic mechanism of the films can easily be controlled by changing rotation speed for potentially flexible new device applications such as spintronics, magnetic hetero-structures, magnetic separators, etc.

Improved Reversibility of Thin-Film Solid Oxide Cells at 500 °C by Tailoring Sputtering Processes for Depositing Yttria-Stabilized Zirconia Electrolyte.

The present study investigates the impact of sputtering configurations on the microstructure and crystallinity of thin-film yttria-stabilized zirconia electrolytes for anodized aluminum oxide-supported all-sputtered thin-film reversible solid oxide cells. Employing various sputtering parameters, such as target-substrate distance and substrate rotation speed, the present study reveals distinct surface characteristics and crystalline structures of thin-film yttria-stabilized zirconia. The microstructure analysis includes scanning electron microscopy and atomic force microscopy examinations, uncovering the influence of the process parameters on the surface morphology, roughness, and grain size. X-ray diffraction data illustrate the texture preferences and crystallite characteristics. The electrochemical characterization of the reversible solid oxide cells demonstrates that the optimized sputtering configuration significantly outperforms the others in both SOFC and SOEC modes, showing exceptional current densities of 964 mA/cm2 at 1.3 V in electrolysis mode at 500 °C. Electrochemical impedance spectroscopy further reveals improved charge transfer reactions at the interface of the electrolyte. The enhanced electrochemical performance is attributed to the unique microstructure and crystallinity of the thin film of yttria-stabilized zirconia. The record-breaking electrolysis performance of this work at 500 °C underscores the potential of tailored sputtering parameters in optimizing the reversible solid oxide cell performance.

Effect of oxygen flow on electrical and optical properties of ITO films synthesized by magnetron sputtering method

The tin-doped indium oxide thin films were synthesized by DC magnetron sputtering on the surface of polished silicon samples and glass slides in a mixed argon-oxygen atmosphere. The other deposition parameters: operating pressure, magnetron power and substrate rotation speed were kept constant. Thickness and density of thin films were measured by X-ray Reflectometry. The effects of oxygen flow rate and substrate temperature on the optical and electrical properties were investigated. The electrical properties (resistivity, Hall mobility and charge concentration) of the thin films were measured by the Van der Pauw method using the Hall effect. The minimum value of resistivity 0.52 × 10-3 Ohm·cm, and maximum charge mobility 28 cm2V-1s-1 was achieved at an oxygen proportional gas mixture of 2.6% (0.71 sccm). The transmission spectra of the films were measured in the wavelength range from 300 to 1100 nm. The transmittance of all films exceeds 75% in the visible and near-infrared spectral ranges. It was found that increasing the oxygen flow rate and heating of the substrate up to optimal value 150°C led to an increase in the crystallinity of the films and, consequently, to an increase in the Hall mobility and the transmittance.

Comparison of properties of multilayer film sputtered on glass and polypropylene substrates with angular DC magnetron Co-sputtering system

Complex multilayer film structures were fabricated through a custom-built angular DC magnetron co-sputtering system. In this system, separate Cu, Al, and brass (Cu + Zn) targets were mounted on three magnetron guns, working in conjunction with a rotating substrate. This study aimed to compare the properties of films with intricate structures, which were sputtered onto glass slides and polypropylene substrates. The sputtering process was optimized using a Box–Behnken design, considering three variable operating conditions: substrate rotation speed, sputtering time, and sputtering voltage. The Analysis of Variance (ANOVA) results for film thickness and roughness, sputtered with three different materials onto glass slides and polypropylene (PP) substrates, indicated that all three independent variables significantly influenced the optimum response, with P-values less than 0.05 (<α = 0.05). The optimal conditions for maximizing the thickness and roughness of the sputtered film on PP substrates differed from those obtained for the thin-film properties of the sputtered film on glass slide substrates. Top-view images of the surface morphology revealed a dense and granular structure for the film deposited on the glass slide, whereas some grooves between the grains and fractures were observed in the film on the PP substrate.Additionally, it was evident that these sputtered multilayer films exhibited a complex structure, as reflected in the uniform and homogeneous distribution of Cu, Al, and Zn atoms on both glass slides and PP substrates.

Electroforming as a Novel One-Step Manufacturing Method of Structured Aluminum Foil Current Collectors for Lithium-Ion Batteries

Conventionally, cathode current collectors for lithium-ion batteries (LIB) consist of an aluminum foil generally manufactured by a rolling process. In the present work, a novel one-step manufacturing method of structured aluminum foil current collectors for lithium-ion batteries by electroforming is introduced. For this, a low-temperature chloride-based ionic liquid was used as an electrolyte and a rotating cylinder out of stainless steel as a temporary substrate. It was shown that the structure of the aluminum foils can be adjusted from dense and flat to three-dimensional by choosing an appropriate substrate rotation speed and current density. Scanning electron microscopy (SEM) and white light interferometry (WLI) were utilized to analyze the foils’ surface morphology, structure and topography. The SEM analysis of the aluminum foils showed that the rolling process produced a foil with small grains, while electrodeposition resulted in foils with different degrees of grain growth and seed formation. This was in total agreement with WLI results that revealed significant differences in terms of roughness parameters, including the peak-to-valley difference Rpv, the root-mean-square roughness Rq and the arithmetic mean roughness Ra. These were, respectively, equal to 6.8 µm, 0.35 µm and 0.279 µm for the state-of-the-art foil and up to 96.6 µm, 10.92 µm and 8.783 µm for the structured electroformed foil. Additionally, cyclic voltammetry (CV) of the aluminum foils was used to investigate their passivation behavior within the typical LIB cathode potential operation window. The strong decrease in the current density during the second cycle compared to the first cycle, where an anodic peak appeared between 4.0 and 4.4 V vs. Li/Li+, demonstrated that passivation occurs in the same manner as observed for commercial Al current collectors.

Pinhole-free 2D Ruddlesden–Popper perovskite layer with close packed large crystalline grains, suitable for optoelectronic applications

Here, we achieved pinhole-free 2D Ruddlesden–Popper Perovskite (RPP) BA2PbI4 layers with close packed crystalline grains with dimension of about 30 × 30 µm2, which have been demonstrated to be favorable for optoelectronic applications, such as fast response RPP-based metal/semiconductor/metal photodetectors. We explored affecting parameters in hot casting of BA2PbI4 layers, and proved that oxygen plasma treatment prior to hot casting plays a significant role to achieve high quality close packed polycrystalline RPP layers at lower hot cast temperatures. Moreover, we demonstrate that crystal growth of 2D BA2PbI4 can be dominantly controlled by the rate of solvent evaporation through substrate temperature or rotational speed, while molarity of the prepared RPP/DMF precursor is the dominant factor that determines the RPP layer thickness, and can affect the spectral response of the realized photodetector. Benefiting from the high light absorption and inherent chemical stability of 2D RPP layers, we achieved high responsivity and stability, and fast response photodetection from perovskite active layer. We achieved a fast photoresponse with rise and fall times of 189 µs and 300 µs, and the maximum responsivity of 119 mA/W and detectivity of 2.15 × 108 Jones in response to illumination wavelength of 450 nm. The presented polycrystalline RPP-based photodetector benefits from a simple and low-cost fabrication process, suitable for large area production on glass substrate, a good stability and responsivity, and a promising fast photoresponse, even around that of exfoliated single crystal RPP-based counterparts. However, it is well known that exfoliation methods suffer from poor repeatability and scalability, which make them incompatible with mass production and large area applications.

Microstructure Refinement of EB-PVD Gadolinium Zirconate Thermal Barrier Coatings to Improve Their CMAS Resistance

Rare-earth zirconates are proven to be very effective in restricting the CMAS attack against thermal barrier coatings (TBCs) by forming quick crystalline reaction products that seal the porosity against infiltration. The microstructural effects on the efficacy of Electron Beam-Physical Vapor Deposition gadolinium zirconate (EB-PVD GZO) against CMAS attack are explored in this study. Four distinct GZO microstructures were manufactured and the response of two selected GZO variants to different CMAS and volcanic ash melts was studied for annealing times between 10 min and 50 h at 1250 °C. A significant variation in the microstructural characteristics was achieved by altering substrate temperature and rotation speed. A refined microstructure with smaller intercolumnar gaps and long feather arms lowered the CMAS infiltration by 56%–72%. Garnet phase, which formed as a continuous layer on top of apatite and fluorite, is identified as a beneficial reaction product that improves the CMAS resistance.

Effect of substrate rotation speed on AlGaN nanowire deep ultraviolet light-emitting diodes by molecular beam epitaxy

Aluminum gallium nitride (AlGaN) nanowires by molecular beam epitaxy (MBE) have become an emerging platform for semiconductor deep ultraviolet (UV) light-emitting diodes (LEDs). Despite of the progress, much less attention has been paid to the effect of substrate rotation speed on the device performance. Herein, we investigate the effect of the substrate rotation speed on the nanowire height and diameter uniformity, as well as the electrical and optical performance of MBE-grown AlGaN nanowire deep UV LED structures with low and high substrate rotation speeds. It is found that by increasing the substrate rotation speed from 4 revolutions per minute (rpm) to 15 rpm, the statistical variation of the nanowire height and diameter is reduced significantly. Increasing the substrate rotation speed also improves the device electrical performance, with a factor of 4 reduction on the device series resistance. This improved electrical performance further transfers to the improved optical performance. The underlying mechanisms for these improvements are also discussed.

Deposition processing and surface metrology of MoNx thin films by design of experiment and single variable (nitrogen flow rate) methods

In this study, the Taguchi design of experiment (DOE) was performed to optimize the deposition process of MoNx thin films using unbalanced magnetron sputtering (UBMS). Further single-variable experiments based on the sensitive parameter derived from the Taguchi experiments were conducted to investigate the effect of the parameter on the phase evolution, structure, and properties of the MoNx thin films. The MoNx thin films were deposited using DC-UBMS. Four controlling factors: N2 flow rate, substrate bias voltage, substrate temperature, and substrate rotational speed were selected in the Taguchi L9 matrix experiment. Electrical resistivity and hardness were chosen as the quality characteristics for the optimization. Analysis of variance (ANOVA) and analysis of mean (ANOM) were performed to identify the sensitive parameters and the optimum conditions. The confirmation test results for the optimizations of hardness (SH) and electrical resistivity (SR) were within the predicted ranges, and therefore the feasibility and reliability of the Taguchi optimization were verified. The results of ANOVA showed that nitrogen flow rate was the most sensitive factor. The optimum condition for the electrical resistivity was chosen to be the reference for the single-variable experiments, and nitrogen flow rate was selected as the controlling variable. The MoNx specimens in the single-variable experiment showed prevailing (200) texture that could be attributed to the lowest surface energy associated with (200) plane and the base metal steering effect by Mo (110). The results of single-variable experiments indicated that the retained Mo metal phase played an important role in hardness, electrical resistivity, and residual stress.

Effect of substrate rotation and rapid thermal annealing on thermoelectric properties of Ag-doped Sb2Te3 thin films

In this work, homogeneous Ag-doped Sb2Te3 (AST) thin films were prepared using the rf magnetron sputtering technique. Thermoelectric properties of AST films have been investigated in terms of various substrate rotation speeds (20, 40, 60, and 80 rpm) and rapid post-thermal treatments at 250 oCin a vacuum. It was found that the thickness of AST films decreases with the increase in substrate rotation speeds. An Ag atomic composition slightly increases and the other Sb and Te atomic compositions slightly decrease with the increase of substrate speed rotations. The post-thermal treatment improved film crystallinity. Carrier scatterings at the grain boundaries tend to increase the resistivity and the Seebeck coefficient. The maximum power factor of 4.60 mW m−1K−2 (ρ = 19 μΩm, S = 298 μVK−1) is obtained in the AST thin films prepared with the substrate rotation speed of 60 rpm. The practical application of AST films was also reported via a thermoelectric module of five p-AST/n-Bi2Te3thin-film pairs with its achieved output power of 1.6 nW at ΔT = 20 K.

Low-cost drum granulator for mechanized seedball production

Seed granulation is a coating technique, which turns a raw material mixture of sand, loam, water, seeds, and fertilizers into seedballs. It enhances the seedling establishment and early growth of crops, like pearl millet, in nutrient-poor soil. Mechanization is highly required, as large-scale production poses challenges to local farmers due to time constraints and labor demand. The prototype of a drum granulator for seeds, also known as a seedball machine, essentially consists of a metal frame and a drum. The seedballs are formed by a rotational motion of the drum. The construction and operation of the machine were designed to be simple. In this study, the combined effect of different factors, such as substrate composition, rotational speed and residence time was taken into account. This study revealed that the amount of loam and the rotational speed of the drum appeared to be the most influencing factors on seedball production and quality. The machine had a production capacity of seedballs ten times higher than manual production. The machine-made seedballs were also of high quality, exceeding 98% germination rate under greenhouse conditions. Besides pearl millet, the machine can be potentially used for other small-sized seeds, such as cotton or sesame.

Designed and Produced the Rotary Substrate Holder and Its Optimized in Angular DC Magnetron Co-Sputtering System

We report the design approach of a home-built rotary substrate holder on simple rotation stages for low-pressure vacuum applications. The result of designing and fabricating the rotary substrate holder that it can be successfully used to rotate the substrate in a low-pressure vacuum application without pressure fl uctuations and leakage. Then we investigated the suitable thin fi lm deposition by fabricating optimal multilayer coatings under three variable operating conditions: Speed of substrate, deposition time, and discharge voltage. The thin film deposition result of three copper targets was mounted on each magnetron gun, providing a total of three magnetron guns. The thin fi lm was deposited on a glass slide at room temperature using a custom-built angular DC magnetron co-sputtering system. Analysis of variance for the response surface regression model of film thickness as a function of the three independent variables shows that substrate rotation speed, sputtering time, sputtering voltage, and coeffi cient of squared sputtering time are the most signifi cant factors in determining the optimum film thickness. The optimum thin-film deposition with substrate rotation speed, sputtering time, and sputtering voltage of 10 rpm, 8.61 min, and 200%V, respectively, maximizes the thickness of 72.036 nm.

Effect of substrate rotational speed during deposition on the microstructure, mechanical and tribological properties of a-C:Ta coatings

Rotational speed has an important influence on the performance of coating materials. The a-C:Ta composite coatings were prepared by controlling the substrate rotational speed during deposition process using PVD technique. The results showed that the coating transformed from dense structure to columnar structure. Due to the changes of deposition time and the vapor incident angle of the sputtering ions, the sp2 hybrid structure increased and the C–Ta bonds contents decreased as a function of the rotational speed, which led to the improvement of adhesion force. The average friction coefficient of the composite coatings did not fluctuate significantly for the amorphous carbon matrix and the transfer films formed during friction, while the wear rates were gradually increased. The sample at 0.5 rpm possessed the lowest wear rate, which was mainly associated with the cooperative behavior of the dense structure and the formation of TaC nanoclusters in the composite coating.

Микроструктура и остаточные напряжения многослойных покрытий ZrN/CrN, полученных плазменно-ассистированным вакуумно-дуговым методом

Introduction. The current state of the art in the field of hard coatings application requires the formation of nanostructured compositions using different chemical elements. Modern hard coatings are able to combine different properties such as high hardness, wear resistance, corrosion resistance. At present, coatings formed by layer-by-layer deposition of zirconium and chromium nitrides are promising. When depositing combinations of chemical elements on various substrates, studies are required aimed at investigating its microstructure and, mainly, residual stresses formed during the deposition of multilayer coatings. The purpose of this work is to investigate the structural-phase state and residual stresses of ZrN/CrN system coatings formed by plasma-assisted vacuum-arc method from the gas phase. Research methods. Samples with coatings of zirconium and chromium nitrides deposited on substrates of hard alloy VК8 are investigated. Transmission electron microscopy is used to study the microstructural characteristics of multilayered coatings and X-ray diffraction analysis is used to quantify macroscopic stresses. Results and discussion. Based on the experimental results obtained it is found that changing the modes of deposition of multilayer ZrN/CrN coatings with regard to rotation speeds of table and substrate holder leads to variations in microstructure, morphology and internal stresses of surface layers of multilayer coatings. It is shown that by changing conditions for the multilayer coating deposition the possibilities of forming ZrN/CrN coatings on the substrate made of VK8 alloy with nanoscale thickness of coating layers open up. X-ray diffraction analysis indicates mainly insignificant stresses, and at high table and substrate rotation speeds – high compressive stresses in the multilayer coating. Transmission electron microscopy revealed that CrN and ZrN coatings have a common multilayer coating growth texture at low rotation speeds, and at high speeds a textural misorientation of the phases of the coating layers is observed. Based on the results obtained it is possible to recommend coatings of ZrN/CrN system as hard coatings.

Investigation of omnidirectional transmittance related to ITO nanorods orientation for optical applications

Indium-doped tin oxide (ITO) nanorods thin films were fabricated on silicon (100) wafer and commercial thin film coated glass (ITO-G) substrates via ion-assisted electron-beam evaporation system with inclinable and rotatable substrate setup. The thickness was controlled in the range of 100–400 nm through the QCM monitoring. With the fixed substrate's tilted angle at 85°, the film's structures were respectively observed as the slant and vertical nanorods corresponding to the substrate's rotation speed of 0 and 30 rpm by the field-emission scanning electron microscope (FE-SEM). The grazing-incident X-ray diffraction (GIXRD) and photoelectron spectroscopy (PES) were used to analyze the crystallinity and atomic composition of the ITO nanorods films. It was observed that the films were amorphous and non-significant of composition variation relative to the change of the film's-controlled thickness and structure. The optical transmittance in omnidirectional (omni-T) of p- and s-polarized light was determined through the variable-angle UV-VIS-NIR spectrophotometer. We found the different profiles of the omni-T with the change of film's structure and thickness which could be explained through the generated birefringence of the films. In addition, the different results of the p- and s-polarized were also discussed.

Spatial ALD of Al2O3 and ZnO using heavy water

Al2O3 and ZnO thin films were deposited from trimethylaluminium (TMA) and diethylzinc (DEZ) in combination with water using cylindrical rotating substrate spatial atomic layer deposition (SALD). The depositions were done between 67 and 140 °C. The growth per cycle for Al2O3 varied between 0.75 and 2.0 × 1015 at./cm2 per cycle and for ZnO between 0.52 and 1.07 × 1015 at./cm2 per cycle. The hydrogen incorporation was studied by varying the deposition temperature and substrate rotation speed. The rotation speed affects the precursor exposure time (46–458 ms) and inert gas purging time (111–1120 ms). The results show that Al2O3 films can contain up to 25 at.% of hydrogen when the deposition temperature is 67 °C or the deposition exposure/purging times are short. The deposition of ZnO in similar conditions produces films with hydrogen concentrations up to 15 at.%. The source of impurity hydrogen was investigated by using heavy water, 2H2O, as an oxygen source. The main hydrogen isotope in the Al2O3 films at low temperatures and fast deposition speed was found to be 1H, while at higher temperatures and lower deposition speeds 2H isotope was dominant. For ZnO, 1H was the majority hydrogen isotope in the films in all the studied deposition conditions except at the lowest rotation speed.

Исследование структурно-фазового состояния и механических свойств покрытий ZrCrN, полученных вакуумно-дуговым методом

Introduction. Modern technologies allow the synthesis of nanostructured coatings from multiple chemical elements to combine different physical, mechanical, and chemical properties in one coating. Promising in this respect are coatings formed via layer-by-layer deposition of zirconium and chromium nitrides. The deposition of various chemical elements on various substrates requires separate studies in order to produce high-strength and wear-resistant coatings. The purpose of this work is to study the structural-phase state and mechanical properties of ZrCrN coatings formed by plasma-assisted vacuum arc evaporation. Materials and methods. The investigation is performed on specimens comprising VK8 hard alloy substrates with zirconium and chromium nitride coatings as well as with multilayer ZrCrN coatings. The methods used are confocal laser scanning microscopy, X-ray diffraction analysis, high-resolution scanning electron microscopy, nanoindentation, and scratching. Results and discussion. The experimental results obtained showed that the mode of multilayer ZrCrN coating evaporation greatly affects the structure, morphology, surface roughness, and mechanical properties of the coatings. In particular, by varying the substrate rotation speed during coating deposition it is possible to control the deposition time of each coating layer and thereby modify the layer properties. Conclusions. The investigation results showed that variation of the evaporation conditions allows one to obtain a ZrCrN coating with a high nanohardness of 45 GPa on a VK8 alloy substrate. Analysis of mechanical test results indicate good adhesion between the studied coatings and the substrate. Scratch tests revealed that fracture of CrN and ZrN coatings occurs by the cohesive mechanism, and the surface of ZrCrN coatings exhibits uniform scratches without any signs of fracture. Based on the results obtained, ZrCrN-2…ZrCrN-4 coatings can be recommended for use as hard and wear-resistant coatings.

Shape effect of Co nanoparticles on the electric and magnetic properties of Co–SiO2 nanogranular films

Controlling the magnetic anisotropy of nanoparticles is a crucial but challenging step for developing new magnetic functions. Here, we demonstrate a simple approach to controlling the shape of Co nanoparticles in a Co-SiO2 nanogranular film from oblate to prolate spheroid by varying the substrate rotation speed during the tandem fabrication process without changing the film composition (Co:SiO2 = 3:7). Changing the nanoparticles from oblate to prolate, increasing perpendicular length of ellipsoidal nanoparticles, changes the magnetic anisotropy axis of Co–SiO2 nanogranular films from in-plane to out-of-plane, which indicates that the shape anisotropy profoundly affects the magnetic properties. Despite the small tunneling current of a few tens of nanoamperes, a maximum tunneling magnetoresistance effect of up to 2.8 % was realized under an applied magnetic field of 12 kOe in the film plane. Achieving both in-plane and perpendicular spin-dependent tunneling, the anisotropic nanogranular films imply direction controllable tunneling materials as future topological nanoarchitecture. Such high-resistivity nanogranular films with a controllable magnetic nanoparticle shape facilitate the design of new magneto-optical devices with high withstand voltages.

Characteristics of Self-Nanostructured Growth of 4,6-Bis(3,5-di(pyridin-3-yl)phenyl)-2-Methylpyrimidine (B3PyMPM).

In this study, we report the self-nanostructured growth of 4,6-bis(3,5-di(pyridin-3-yl)phenyl)-2-methylpyrimidine (B3PyMPM), which is widely used as an electron transport layer for organic light-emitting diodes (OLEDs). B3PyMPM nanostructures were formed on the surface of a substrate using vacuum thermal evaporation, and parameters such as substrate rotation speed and evaporation angle were altered to study their effect on the growth of nanostructures. Moreover, it was proven that the growth of nanostructures was dependent on the underneath materials. This self-nanostructured growth of B3PyMPM would affect the outcoupling and the efficiency improvement of OLEDs.