Single-walled carbon nanotube thin films solution-deposited on the glass substrate were directly patterned by a spatially-modulated pulsed laser beam (wavelength=355nm, pulse width=5ns) incident from the backside of the substrate. This method utilizes a ultrashort pulse-induced strong thermo-elastic force exerting on the film which plays a role to detach it from the substrate. The threshold energy density required for patterning was as low as 90mJ/cm2, making it possible to pattern over a few square centimeters by a single pulse with maximum energy of 180mJ. The irradiated regions of the film were clearly photoetched without leaving any residual nanotubes. High-fidelity patterns could be fabricated with a feature size of 35μm.
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