Micromachining of a nanoscale tip for near field scanning optical microscopy (NSOM) and scanning force microscopy(SFM) has been described. The tapered optical metal-coated fiber is generally used to provide a sub-wavelength sized aperture on tip. Several micromachining methods have been performed in order to have a metal aperture with radius less than @l/2. Apertures provided with less than @l/2 and hollow tips would provide a suitable probe for both NSOM and SFM. A tip coated with thin metal film will meet these requirements. The Si tip have been initially fabricated using reacting ion etching (RIE). The SiO2 etch masks with [email protected] and [email protected] were patterned followed by Si etching. The etched Si post was at least 3 @mm tall and the radius of the tip was found to be 30nm and ~10nm depending on the fabrication methods. A Si3N4 thin film was deposited on the fabricated Si -tip using a low pressure chemical vapor deposition technique in order to provide a capability for atomic force microscope. A Cr metal film was deposited using thermal evaporator. The thick photoresist film was coated using two-stage methods in order to cover the tall [email protected] tip. The PR film was carefully etched to have a metal aperture size with less than @l/2.
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