Removal Of Film Research Articles

Using MA-rFTIR Mapping as a Tool to Assess the Efficacy of Cleaning Treatments and to Aid in the Restoration Activities of Paintings

The removal of non-original superimposed layers covering the original pictorial layer in paintings is a common practice to restore the authentic appearance of surfaces and mitigate potential risks to artwork preservation. Contemporary assessments of the effectiveness of such cleaning treatments often employ non-destructive analytical methods. However, many existing techniques face limitations, either lacking specificity in compound identification or analyzing very limited areas (<millimeters) through a point-by-point approach. This study introduces the application of a macro Fourier transform infrared scanner, in reflection mode (MA-rFTIR), as an effective tool for supporting restorers during cleaning processes. This method proved successful in addressing challenges related to the removal of calcium oxalate films and non-original superimposed layers on two ancient paintings.

Crosslinking-induced patterning of MOFs by direct photo- and electron-beam lithography

Metal-organic frameworks (MOFs) with diverse chemistry, structures, and properties have emerged as appealing materials for miniaturized solid-state devices. The incorporation of MOF films in these devices, such as the integrated microelectronics and nanophotonics, requires robust patterning methods. However, existing MOF patterning methods suffer from some combinations of limited material adaptability, compromised patterning resolution and scalability, and degraded properties. Here we report a universal, crosslinking-induced patterning approach for various MOFs, termed as CLIP-MOF. Via resist-free, direct photo- and electron-beam (e-beam) lithography, the ligand crosslinking chemistry leads to drastically reduced solubility of colloidal MOFs, permitting selective removal of unexposed MOF films with developer solvents. This enables scalable, micro-/nanoscale (≈70 nm resolution), and multimaterial patterning of MOFs on large-area, rigid or flexible substrates. Patterned MOF films preserve their crystallinity, porosity, and other properties tailored for targeted applications, such as diffractive gas sensors and electrochromic pixels. The combined features of CLIP-MOF create more possibilities in the system-level integration of MOFs in various electronic, photonic, and biomedical devices.

Femtosecond laser precision machining of carbon film based on aramid paper substrate

Carbon film has many applications in flexible electronic devices (FED) due to its low cost and high conductivity. However, it is difficult to remove carbon film from the substrate without damaging it. This research explores the use of femtosecond laser, which has minimal thermal effect and non-contact processing, for carbon film ablation. The main objectives are to determine the ablation threshold of carbon film and aramid paper, to optimize the laser ablation parameters and scanning path, and to analyze the ablation mechanism and quality. The results show that the optimal laser fluence is between 0.22 J/cm2 and 1.45 J/cm2, and the optimal scanning method is grid scanning method. The laser ablation achieves a removal depth of 9.4 μm and a minimum Sa of 3.0 μm. Raman spectroscopy confirms the complete removal of carbon film and the transformation of graphite to amorphous carbon. The ablation process is mainly governed by combustion and evaporation. A resistance strain gauge is fabricated using laser ablation to demonstrate its potential in carbon film FED manufacturing.

Characterization of modified titanium surfaces by anodisation and immersion tests

This paper explores the features of both nanoporous and compact TiO2 films formed by titanium anodisation in two experimental conditions, given that they have completely different morphologies and properties than those found by our previous studies. After anodisation, samples have been subjected for 20 days to immersion tests in different media (H2O, H3PO4, and KOH). Surface morphology, phase composition and wettability of anodised films were investigated using FESEM, FTIR, Raman spectroscopy, contact angle measurements and XPS, and the hydrophilicity of modified surfaces was investigated by immersion tests. Nanoporous films exhibited hydrophobic surfaces, but contact angle values gradually decreased after immersing films in H2O, H3PO4 and KOH media, respectively. However, compact films produced superhydrophilic surfaces, both before and after immersion tests, with the exception of immersing the film in a H3PO4 medium due to film removal by acid attack. As for compact films, an unusual morphology revealed by the presence of cone-shaped particles might be responsible for the adsorption of –OH groups arranged so as to favour anatase phase formation.

Development of prominent bonding strength in Al/Mg bimetal composites prepared by ultrasonic vibration-assisted compound casting: Effects of ultrasonic powers

In this work, the A356/AZ91D bimetal composites were prepared by ultrasonic vibration-assisted lost foam compound casting, and the effects of ultrasonic powers on interfacial microstructures and mechanical properties of the Al/Mg interfaces were investigated. Results revealed that the Al/Mg bimetal composites without ultrasonic vibration treatment (UVT) were heterogeneous, and the Al/Mg interface was composed of Al-Mg intermetallic compounds (IMCs, i.e., Al3Mg2 and Al12Mg17) area and Al-Mg eutectic structures (δ-Mg+Al12Mg17) area. The Mg2Si particles were gathered at the IMCs area and an oxide film that mainly composed of Al2O3 was existed between the IMCs area and eutectic structures area. With UVT, the oxide film was eliminated and the gathered Mg2Si particles were refined and dispersed by the acoustic cavitation effect, and part of the Al3Mg2 and Al-Mg eutectic structures were transformed into the Al12Mg17 due to the promoted solute interdiffusion, which improved the homogeneity of the Al/Mg interfaces. Besides, the grains of the Al/Mg interface with UVT under ultrasonic power of 75 W were significantly refined. The thickness of Al/Mg interface was increased with the increase of the ultrasonic power. Due to the excessive heat induced by UVT under the further increased ultrasonic power, the cooling rates and the degree of supercooling were reduced, resulting in the coarsening of interfacial grains. The microhardness of the Al/Mg interfaces was increased and got more uniform by UVT. The shear strengths of the Al/Mg bimetal composites with UVT were enhanced to 61.4 MPa from 32.4 MPa, with an increase of 89.5 % compared with that of the Al/Mg bimetal without UVT. This could be ascribed to the removal of the oxide film, the refinement of the interfacial grains and the dispersed and refined Mg2Si particles achieved by UVT, which hindered the crack propagation during deformation.

Application of pulsed laser ablation thermal model in nanosecond pulsed laser removal of the epoxy resin paint film

The effect of laser surface paint removal depends on the mechanism of paint removal. The mechanism of nanosecond laser removal of epoxy resin paint film on aluminum alloy surfaces was studied theoretically and experimentally. Firstly, a laser thermal paint removal model was established based on the heat conduction equation, Hertz-Knudsen equation, and Hooke's law. The adsorption relationship between the paint film and the aluminum alloy substrate molecules and the adsorption force between the paint film and the substrate were analyzed and calculated. A laser thermal paint removal model was solved using COMSOL finite element software. By analyzing the changes in temperature and thermal stress with laser fluence, we obtained the theoretical threshold for laser paint removal. Subsequently, experimental research was conducted on laser paint removal. Through theoretical and experimental studies, it was found that the paint removal threshold of nanosecond pulse laser is 0.47 J/cm2. The primary mechanism of nanosecond laser paint removal is thermal stress stripping. When the laser fluence is low, the nanosecond pulse laser can only ablate the paint on the surface, and the thermal stress between the paint film and the substrate makes it difficult to remove the paint film. As the laser fluence increases, the nanosecond laser will ablate the surface paint film, and the thermal stress between the paint film and the substrate will cause the stripping of the underlying paint film and the substrate. The primary mechanism of laser paint removal is stripping.

Intergranular corrosion of Ni-30Cr in high-temperature hydrogenated water after removing surface passivating film

High-resolution transmission electron microscopy and atom probe tomography are used to characterize the initial passivation and subsequent intergranular corrosion of degraded grain boundaries in a model Ni-30Cr alloy exposed to 360 °C hydrogenated water. Upon initial exposure for 1000 h, the alloy surface directly above the grain boundary forms a thin passivating film of Cr2O3, protecting the underlying grain boundary from intergranular corrosion. However, the metal grain boundary experiences severe Cr depletion and grain boundary migration during this initial exposure. To understand how Cr depletion affects further corrosion, the local protective film was sputtered away using a glancing angle focused ion beam. Upon further exposure, the surface fails to repassivate, and intergranular corrosion is observed through the Cr-depleted region. Through this combination of high-resolution microscopy and localized passive film removal, we show that, although high-Cr alloys are resistant to intergranular attack and stress corrosion cracking, degradation-induced changes in the underlying metal at grain boundaries make the material more susceptible once the initial passive film is breached.

Effects of pyrazine and its derivatives as inhibitors on copper film chemical-mechanical polishing properties for ruthenium-based copper interconnect

During the one-step chemical mechanical polishing (CMP) process of ruthenium (Ru)-based copper (Cu) interconnected Cu films, a high Cu removal rate (RR) while maintaining a near zero Ru RR should be required to ensure a flat surface. The most ideal and difficult part of the CMP process is how to achieve rapid removal of Cu film without affecting Ru layer. Corrosion inhibitors in the slurry fulfill a significant function in controlling RR and improving the surface quality. Therefore, in this study, pyrazine (PY) and its derivative aminopyrazine (AP) as cost-effective and harmless corrosion inhibitors for Ru-based Cu interconnected Cu film CMP were investigated under weakly alkaline conditions (pH=8.5). First, through the utilization of experimental and theoretical methods, a systematical analysis was conducted to assess the corrosion inhibition effects of AP and PY, and it was found that the corrosion inhibition effect of AP was stronger than that of PY. Then, the adsorption and inhibition mechanism of AP on Cu/Ru surface were analyzed by electrochemical testing and X-ray photoelectron spectroscopy (XPS), and the adsorption behavior of AP molecules on the Cu (111) surface was investigated at the molecular level using quantum chemical methods. Finally, tests on Cu patterned wafers showed that the combination of 0.5 wt% AP and 0.5 wt% sarcosine (Sar) proved to be successful in effectively rectifying the step height on the Cu patterned wafer. At the same time, a high RR of 7281 Å /min, a low surface root mean square deviation (Sq) of 1.35 nm in 10 μm×10 μm region and a low static etching rate (SER) of 1015 Å /min were obtained with the synergistic effect of AP and Sar. This outcome holds substantial theoretical implications for advancing the formulation of low-node Cu film slurry.

Strong nanostructured film and effective lead (II) removal by nitro-oxidized cellulose nanofibrils from banana rachis

Strong nanostructured film and effective lead (II) removal by nitro-oxidized cellulose nanofibrils from banana rachis

Removal Characteristics of Ni-Ferrite Oxide Film Formed on the Stainless Steel Surface in Fiber Laser Decontamination

Every nuclear facility has a limited operating life, at the end of which they must be shut down and decommissioned. For decommissioning, the removal of radioactive contaminants and demolition should be considered. Before nuclear power plants are decommissioned, the primary system, which is the most heavily contaminated, is decontaminated first, followed by decontamination of the surfaces of containment containers and buildings. This study examined the removal characteristics of Ni-ferrite coated on the stainless steel (STS304) specimen surface using an eco-friendly laser that generates little secondary waste, and derived the optimal efficiency conditions for laser decontamination. In this study, simulated oxide film specimens were fabricated by coating the STS304 substrate using non-radioactive Ni-ferrite. The experimental equipment for laser decontamination was a Q-switched fiber laser with an average power of 100 W. The laser beam was irradiated on the surface of the specimen according to the beam overlap rate. In addition, the characteristics of the decontaminated area and removal of the coating layer were checked using digital 3D microscopy, scanning electron microscope (SEM), and X-ray diffraction (XRD). The results of laser decontamination experiment indicated the possibility of coating layer removal with fewer scans as the x- or y-axis directions beam overlap rate increased. However, the surface was discolored when excessive overlaps occurred. This study provided basic data for laser decontamination applicable to the removal of Ni-ferrite oxide films on STS304.

Integrating run-to-run control with feedback control for a spatial atomic layer etching reactor

Semiconductor manufacturing employs an intricate framework of processes that require accurate design specifications at the nanoscale level. Thermal atomic layer etching fulfills these stringent criteria in an exemplary manner by conducting top-down removal of transistor films to further downsize thicknesses and facilitate transistor densification on wafers. However, it has low productivity. Thus, a spatial sheet-to-sheet reactor is appropriate for achieving high throughput while maintaining substrate quality. In order to continuously regulate the process, a run-to-run (R2R) controller coupled with a continuous feedback proportional–integral (PI) controller is proposed to mitigate a kinetic shift disturbance and a continuous pressure ramp disturbance through a multivariate input correction procedure. A tuning methodology is employed to determine the optimal tuning parameters to enhance the performance of the R2R and PI controller response to their respective disturbances. Results indicate that the combined R2R and PI controller outperforms the sole R2R controller by minimizing the amount of input correction needed to minimize the etching per cycle offset from the setpoint.

Simulation and Experimental Study on Continuous Wave Fiber Laser Removal of Epoxy Resin Paint Film on the Surface of 6061 Aluminum Alloy

Paint removal is an essential process in the industrial field. Laser technology provides an effective method of paint removal to replace traditional mechanical and chemical methods. This paper establishes a continuous wave (CW) laser thermal paint removal model based on heat conduction theory and Arrhenius’ law. The paint stripping process of epoxy paint film on the surface of 6061 aluminum alloy via CW laser was studied through simulation and experiment. We found that the carbonization of the paint film during the CW laser paint removal process will inhibit the laser paint removal process. Therefore, the paint removal efficiency of the CW laser is limited. The depth of CW laser paint removal increases linearly with the CW laser power density. However, during the CW laser paint removal process, due to the pyrolysis of the paint film and the reflection of the laser by the substrate, the surface temperature of the material first increases and then decreases. In addition, after laser paint removal, the surface roughness of the material after paint removal is reduced due to the melting of the base material. The model established in this article can provide a theoretical reference for studying the CW laser paint removal process.

Statistically distributed nano-scratch testing of AlFeMnNb, AlFeMnNi, and TiN/Si3N4 thin films on silicon

For studying the damage tolerance of thin films, a novel randomly distributed nano-scratch test method was introduced and demonstrated as a promising characterization method. It is capable of more closely simulating the damage progression in abrasion, where material removal can be influenced by the interaction between damage produced by previous scratches in close proximity. In addition to studying how localized failure events affect subsequent damage progression, it is possible to monitor the evolution of the film degradation cycle-by-cycle using the mean depth and friction over the scratch. Randomly distributed nano-scratch tests were performed on the high entropy alloy AlFeMnNb, AlFeMnNi, and nanocomposite (nc-) TiN/Si3N4 thin films on silicon. Brittle fracture and film removal with extensive chipping of the Si substrate were observed over the entire scratched region on AlFeMnNi and nc-TiN/Si3N4 in distributed scratch tests at applied loads that were only ∼0.2–0.3 of the load needed to produce the chipping in ramped load nano-scratch tests due to film and substrate fatigue. In contrast, the softer AlFeMnNb deformed predominantly by ductile ploughing with significantly improved damage tolerance and crack resistance in the distributed scratch tests. The new method can be used to evaluate the performance of thin films in applications where they can be exposed to abrasive/sliding wear. It can provide a more direct measure of abrasion resistance than assuming high resistance to abrasive wear from coating hardness. In the thin film systems studied, higher hardness was associated with greater fracture and delamination in the distributed scratch tests.

The Influence of Scanning Speed on the Removal of Polyethylene Films with Different Colors by 1 μm Continuous Laser was Studied

The Influence of Scanning Speed on the Removal of Polyethylene Films with Different Colors by 1 μm Continuous Laser was Studied

Calculation of optimal intensity of ultrasonic vibrations for removal of oxide films from the surface of ore pulp particles

Calculation of optimal intensity of ultrasonic vibrations for removal of oxide films from the surface of ore pulp particles

(Invited) Atomic Layer Processing of MoS2

Molybdenum disulfide (MoS2) is one of several transition metal dichalcogenides consisting of a layer of transition atoms sandwiched between layers of chalcogens. Interest in MoS2 has been driven by its 1.8 eV direct electronic band gap in monolayer form and its moderate electron mobility (10-100 cm2/Vs) even when only three atoms (~6.5 Å) thick. These properties offer potential for retaining or improving speed and efficiency in scaled electronic devices.Advancing MoS2 and other 2D materials into high volume manufacturing of semiconductor devices requires scalable deposition and etching processes. The process of atomic layer deposition (ALD) has been used to deposit 2D materials and can deposit films at lower temperatures for back-end-of-line (BEOL) compatibility. However, ALD relies on covalent surface reactions. When these reactions occur at high density during film nucleation, the resulting film is typically amorphous or nanocrystalline and requires thermal annealing to form a more well-ordered layered crystal structure. A key challenge is to establish a low temperature ALD process that achieves a layered crystal structure with low defectivity. In terms of material removal, MoS2 films have been etched by plasma-based atomic layer etching (ALE). ALE is analogous to ALD except that cyclic surface reactions promote volatility and lead to film removal rather than deposition. Together, atomic layer deposition and atomic layer etching constitute complementary facets of atomic layer processing and enable new pathways for nanomanufacturing.Here, we describe our recent progress in thermal ALD and thermal ALE of MoS2 films. For ALD of MoS2, we use cycles of MoF6 and H2S between 150-350 °C. Nucleation on metal oxide surfaces shows a strong temperature dependence, which is attributed in part due to the temperature dependence of surface hydroxyl groups. Density functional theory (DFT) calculations support the role of hydroxyls in promoting nucleation and reveal that MoF6 dissociates on the surface rather than participating in a ligand exchange reaction. The dissociation reaction leads to the formation of a metal fluoride interface between the oxide surface and the MoS2 film. Surface species following MoF6 include MoOF4 and MoO3, both of which convert to MoS2 during the H2S pulse, which releases H2O and HF byproducts. Films deposited at 200 °C and below are amorphous but convert to a layered structure upon annealing in H2S. Deposition at 250 °C yields films with a layered crystal structure without post-deposition annealing.Thermal ALE of MoS2 films deposited by ALD can be achieved using alternating exposures of MoF6 and H2O. It was found that MoS2 films are fluorinated by the MoF6 and then oxygenated by H2O. Volatile byproducts are MoF2O2, H2S, and HF, which are primarily released during the H2O half-cycle. Thermal ALE of MoS2 is temperature dependent and follows Arrhenius behavior. At 200 °C, the mass loss per cycle is 6 ng/cm2 (~0.5 Å/cycle) and reaches 271 ng/cm2 at 300 °C. Etch stop behavior was observed once the etched film approached the metal fluoride interface of the growth surface. Layered MoS2 deposited by ALD with post-deposition annealing exhibited layer-by-layer etching at 0.2 Å/cycle at 250 °C.The ALD results provide key insights into the nucleation and growth of MoS2 films using low temperature ALD. Further work is required to control basal plane orientation but achieving crystalline films well within BEOL thermal budgets is promising. The results from the ALE study provide insights into the etching reactions for MoS2. Combining the two processes offers greater control over MoS2 films. Using ALD followed by ALE and post-deposition annealing, we achieved few-layer MoS2 films. These combined thermal processes represent a pathway for integration of MoS2 films into device manufacturing.

Self-Driven Sustainable Oil Separation from Water Surfaces by Biomimetic Adsorbing and Transporting Materials

Oil films on water are an increasingly major contamination problem worldwide. In 2020, we published a novel adsorption and transportation technology for oil–water separation based on biological role models like the floating fern Salvinia. This application provides an unexpected ability for the fast and efficient removal of oil films, particularly in ecologically important freshwater biota. A single small Bionic Oil Adsorber (BOA) with 1 m2 functional textile can collect up to 4 L of oil per hour, which equals about 100 m2 of oil film from a water surface into a collecting vessel. This is a safe, fast, and sustainable solution for the ubiquitous contaminations of, e.g., fuel oil in freshwater environments. Here, we present updated, new experimental data, and a review of the literature published since.

Experimental investigation of laminar and turbulent displacement of residual oil film

Residual oil films on pipe walls are a common occurrence in industrial processes, and their presence can significantly impact system efficiency and performance. However, the mechanisms that govern oil film removal by an immiscible displacing fluid from the internal walls of pipes under different flow regimes, including laminar and turbulent flows, are not yet fully understood. In this study, we investigated the impact of displacing fluid flow regime, injected volume, displacement time, and wall shear stress on the efficiency of residual oil film removal in a pipe. We first verified the applicability of our developed oil film measurement method for the use in vertical pipes, and found that gravity did not significantly affect the long-term oil film removal process. We verified that our results from the laminar cases agree with the theoretical thin-film limit scaling under reasonable assumptions of constant shear stress and negligible surface tension. We then examined the displacement efficiency of residual oil film under laminar and turbulent flow regimes. Our experimental results revealed that the onset of turbulence of displacing fluid played an important role in the efficient removal of residual oil film, with an optimal range of Reynolds numbers (7000–8000) when the injected volume of displacing fluid is limited. Furthermore, we explored the combined effect of wall shear stress and displacement time on the displacement process under different turbulent flow regimes. We found that the intermediate turbulent regime was the most efficient for achieving cleaning in a limited time, while the highly turbulent regime proved to be the most effective for achieving complete cleaning over a longer time period. These findings have important implications for oil recovery and pipeline maintenance and provide valuable insights into optimizing the removal of residual oil film in pipes.

An overview of hydrogen production from Al-based materials

Abstract A profound overview of the recent development for on-time, on-demand hydrogen production from light metal-based hydrolysis is presented. Hydrogen energy is one of the clean and renewable energy sources which has been recognized as an alternative to fossil fuels. In addition, aluminum is the most suitable light activity metal for hydrolysis materials attributed to its safety, environmental friendliness, high-energy density, inexpensive, and low density with high strength ratio. In general, dense oxide films formed act as a barrier on aluminum surfaces. Accordingly, effective removal of the oxide film is a key measure in solving the Al–water reaction. In this review, recent advances in addressing the main drawbacks including high-purity aluminum with acid–alkali solutions, nano-powders of aluminum or composite with acid–base solutions, ball-milled nano-powders, alloying blocks, and gas atomization powders are summarized. The characteristics of these three technologies and the current research progress are summarized in depth. Moreover, it is essential to promote low-cost aluminum-based materials based on effective hydrogen production efficiency and explore ways for practical large-scale applications.

Study on removal of aluminum alloy oxide film by continuous-nanosecond combined laser with different pulse delays

In this paper, the thermal stresses arising from thermal expansion and the adsorption forces between the oxide film and the substrate are calculated from the one-dimensional heat conduction equation. Comparing the magnitude of the two, the laser cleaning conditions are obtained, and relevant models such as plasma shock wave pressure are established. The plasma plume, surface morphology, and elemental composition of aluminium alloy oxide film removed by continuous-nanosecond combined laser with different nanosecond pulse delays were experimentally investigated. At total laser fluence of 3630.47 J/cm2 (continuous laser fluence of 3628.73 J/cm2 and nanosecond laser fluence of 1.74 J/cm2), the removal effect is better with the increase of pulse delay, and the best removal effect is achieved when the pulse delay is 600 ms. Based on the experimental results, the mechanism of oxide film removal by combined lasers with different pulse delays was discussed, and at least two mechanisms of thermal stress against adsorption and plasma shock wave breaking the oxide layer were present to act.