In this paper Electrochromic based micro-mirrors fabrication has been investigated on silicon substrates using a highlyprogrammable deep reactive ion etching technique. Silicon based micro structures have been used as micro containers for Li+ based electrolyte.Covering these micro vessels with WO3 coated ITO electrodes as electrochromic layer, leads to transparent or opaque interfaces which later will be used as image pixels. Passive addressing of micro-mirrors if feasible between mentioned ITO electrodes on top and silicon n+ doped lines at the bottom of micro structures. Desired image can be achieved by addressing each or a cluster of pixels.