A lapping process for achieving high quality alumina (Al 2O 3) surfaces was investigated. Alumina films were sputter deposited on thick TiCAl 2O 3 ceramic wafers. Polishing of these films was carried out on pitch plates (organic resin melted and set on the circular disk of a lapping machine). Abrasives with different grit sizes, 0.05–1.0 μm, were tried together with different lapping process parameters. Qualitu of the lapped surface was studied in terms of roughness and flatness. Stock removal rates were also measured. Correlation of surface quality with lapping parameters was established to achieve process optimization. Scratch-free polished alumina surfaces were obtained by using this technique. Specific applications of the process in the fabrication of magnetic recording devices are indicated.
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