Ge and Nb co-doped anatase TiO2 films are prepared by using radio frequency magnetron sputtering. The structures, resistivities and band gap properties of the films, which depend on Ge and Nb doping amounts, sputtering power and annealing temperature, are discussed. It is found that the band gap and resistivity of TiO2 film can be simultaneously tailored by co-doping with Ge and Nb. With doping volume fractions of 6% Nb and 20% Ge, the resistivity of the film can be reduced from 104 Ω/cm to 10-1 Ω/cm, and the band gap from 3.2 eV to 1.9 eV. After annealing, the Ge and Nb co-doped TiO2 film shows not only a lower resistivity but also a stronger absorption for visible and infrared light. As a result, Ge and Nb co-doped TiO2 film with adjustable band gap and resistivity can be prepared with magnetron sputtering by choosing proper Ge and Nb doping amounts and annealing conditions.