Abstract Titanium dioxide thin films were prepared by a low-temperature atmospheric-pressure chemical vapor deposition method in air. The source gases were generated by heating isopropyl alcohol solutions of titanium tetraacetylacetonate and bis(acetylacetonate) titanium diisopropoxide. On glass and silicon (100) substrates, an amorphous film can be obtained at a substrate temperature in the range 200–500°C, and a polycrystalline anatase film can be obtained at a substrate temperature above 500°C.
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