Silicon Carbide (SiC) technology has emerged as a promising solution to address the growing demand for high-performance power electronics in various applications, ranging from automotive to renewable energy systems. As the industry continues to push the boundaries of SiC technology, scaling opportunities and challenges arise across the entire value chain, from material to device fabrication and new package architectures. In addition, it should be noted that scientific understanding, especially in the areas of defect behaviour in the SiC epitaxy layer, threshold voltage instability, interface trap density, and integrity of the gate insulator, would be increasingly important and necessary for the further development of SiC power devices. To address the economics, and mass produce ultra-high-power electronics devices with improved performance and reliability, we partnered with ecosystem players across the value chain from substrate to power module packaging and set up a 200mm SiC specialty open innovation process line.This talk will provide an overview of the key challenges and opportunities associated with SiC technology. We will discuss the high grow rate (≥50µm/hr) SiC epitaxy process and share methodologies to achieve high-quality epitaxy layer with good doping control (≤10%), tight thickness uniformity (≤3%), low surface roughness (≤3Å) and low crystal defect densities (≤0.4 cm-2) on 200mm 4H-SiC substrate. Moving on to the metal oxide semiconductor (MOS) device interface engineering, we will discuss strategies for achieving low interface trap densities (~1011eV-1 cm-2) and improved threshold voltage instability. Beyond device fabrication, we will highlight the importance of the power module packaging technique in realizing the full potential of SiC technology. This includes the double-side liquid cooling system and the power dissipation capability with different designs and material options for the proposed 6-in-1 power module.Overall, by addressing these challenges collaboratively, we can accelerate the adoption of SiC technology and unlock its full potential to drive power semiconductor technology and beyond. Figure 1
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