Molecular Beam Epitaxy Research Articles

Colossal Strain Tuning of Ferroelectric Transitions in KNbO3 Thin Films

AbstractStrong coupling between polarization (P) and strain (ɛ) in ferroelectric complex oxides offers unique opportunities to dramatically tune their properties. Here colossal strain tuning of ferroelectricity in epitaxial KNbO3 thin films grown by sub‐oxide molecular beam epitaxy is demonstrated. While bulk KNbO3 exhibits three ferroelectric transitions and a Curie temperature (Tc) of ≈676 K, phase‐field modeling predicts that a biaxial strain of as little as −0.6% pushes its Tc > 975 K, its decomposition temperature in air, and for −1.4% strain, to Tc > 1325 K, its melting point. Furthermore, a strain of −1.5% can stabilize a single phase throughout the entire temperature range of its stability. A combination of temperature‐dependent second harmonic generation measurements, synchrotron‐based X‐ray reciprocal space mapping, ferroelectric measurements, and transmission electron microscopy reveal a single tetragonal phase from 10 K to 975 K, an enhancement of ≈46% in the tetragonal phase remanent polarization (Pr), and a ≈200% enhancement in its optical second harmonic generation coefficients over bulk values. These properties in a lead‐free system, but with properties comparable or superior to lead‐based systems, make it an attractive candidate for applications ranging from high‐temperature ferroelectric memory to cryogenic temperature quantum computing.

Molecular beam epitaxy and band structures of type-II antiferromagnetic semiconductor EuTe thin films

The rare-earth Eu-based compounds with a unique half-filled 4f orbital have attracted an amount of research interest recently. Here, we synthesized EuTe(001) single-crystal thin films on SrTiO3(001) substrate via molecular beam epitaxy (MBE). The scanning tunneling microscopy and x-ray diffraction results indicate that the grown EuTe thin films orientated as EuTe[100]//SrTiO3[110] in plane. In the angle-resolved photoemission spectroscopic (ARPES) measurements, the grown EuTe films show a semiconductive band structure with the valence band maximum lying on the center point of the Brillouin zone. The bandgap size of EuTe was further identified by the optical transmission spectra as 2.2 eV. The antiferromagnetic transition temperature of the grown EuTe film is 10.5 K measured by a superconductive quantum interference device (SQUID). Our results provide important information on the fundamental electronic structures for the further research and applications of the Eu-based compounds.

Broadband cavity-enhanced optical flux monitoring

This work describes a new type of sensor for growth process monitoring named broadband cavity-enhanced optical flux monitoring sensor (BBCE-OFM). Like existing optical flux monitoring (OFM) solutions, it relies on absorption spectroscopy. However, the implementation of an optical cavity reduces the measurement uncertainty, enabling efficient operation even at very low growth rates. Using the BBCE-OFM sensor mounted in our solid-source oxide molecular beam epitaxy reactor, we achieved an uncertainty of ±2% on the measurement of Sr and Ti growth rates in SrTiO3 at around 1 Ml/min, to be compared to the ±16% obtained in the same conditions using a conventional OFM setup. Furthermore, our sensor architecture, based on an echelle monochromator and LEDs replacing the hollow cathode lamps used in standard OFM sensors, is more robust against drift.

Reduction of the Threading Dislocation Density in GaSb Layers Grown on Si(001) by Molecular Beam Epitaxy

AbstractThe monolithic integration of III‐V semiconductors on Si emerges as a promising approach for realizing photonic integrated circuits. However, the performance and reliability of epitaxially grown devices on Si are hampered by the threading dislocation density (TDD) generated during the growth. In this study, the efficiency of a structure, combining III‐Sb‐based insertion layers and thermal annealing is evaluated, on the reduction of the emerging TDD in GaSb buffer layers grown on Si(001) substrates by molecular beam epitaxy. the impact of the thickness, composition, and number of the insertion layers is extensively explored. Then a detailed study of the annealing cycles with different conditions is conducted. A record TDD in the low 107 cm−2 for a 2.25 µm GaSb buffer grown on Si(001) is ultimately demonstrated.

Boosting the two-dimensional electron gas density of Al0.20Ga0.80N/GaN heterostructures by regrowth of an epitaxial Sc0.18Al0.82N layer

Sc-alloyed AlN epilayers were grown on commercial GaN/sapphire templates by molecular beam epitaxy (MBE) to validate the Sc composition of 18% and in-plane lattice matching with GaN. As-grown Sc0.18Al0.82N/GaN heterostructure exhibits a two-dimensional electron gas (2DEG) density of 3.58 × 1013 (2.96 × 1013) cm−2 and a mobility of 241 (295) cm2⋅V−1⋅s−1 at 300 (77) K, demonstrating the feasibility of employing its high spontaneous polarization toward high 2DEG density and highlighting detrimental impurity scattering due to the regrowth interface. Implementation of AlN impurity blocking layers boosts 2DEG mobility to 1290 (8730) cm2 V−1⋅s−1at 300 (77) K. In addition, we have engineered a surface-treatment strategy to selectively decompose the 2.5-nm-thick GaN cap layer of commercial GaN(2.5 nm)/Al0.20Ga0.80N(22 nm)/GaN heterostructure epi-wafers at high temperature prior to MBE regrowth of Sc0.18Al0.82N to eliminate impurity incorporation at the regrowth interface. Regrowth of a Sc0.18Al0.82N layer on the pristine Al0.20Ga0.80N surface increases 2DEG density from 7.89 × 1012 to 9.57 × 1012 cm−2, together with a slight reduction in mobility from 2160 to 1970 cm2⋅V−1⋅s−1 at 300 K, reducing the sheet resistance by 10%. Our calculation implies that it is practical to boost 2DEG density to over 2.0 × 1013 cm−2 by thinning Al0.20Ga0.80N down to 4 nm.

Germanium surface segregation in highly doped Ge:β-Ga2O3 grown by molecular beam epitaxy observed by synchrotron radiation hard x-ray photoelectron spectroscopy

We present a study of Ge segregation at the surface of highly germanium-doped gallium oxide (2.5 × 1020 cm−3 nominal doping level) grown by molecular beam epitaxy. We probed the dopant concentration as a function of depth by hard x-ray photoelectron spectroscopy and standard laboratory photoemission spectroscopy. We notably found that there is germanium segregation within the top 2 nm where its concentration is 3 times the nominal doping level. This increased dopant concentration leads to a threefold enhancement of surface conductivity. The results suggest a reliable method for delta doping for power electronics applications.

Two‐Dimensional Layered Topological Semimetals for Advanced Electronics and Optoelectronics

AbstractDue to the outstanding physical properties and the integrated characteristics, such as the gapless band structure, high state density, high conductivity, dangling‐bond‐free surface, and tunable Fermi level, two‐dimensional layered topological semimetals (2D LTSMs) exhibit a promising application prospect for including electrode contact and terahertz detection. Despite the surging in attention, a comprehensive strategy is still crucial to meet the necessary conditions for the practical application of 2D LTSMs. According to the fermion types and the band structures, 2D LTSMs can be divided into Dirac semimetals, Weyl semimetals, and nodal‐line semimetals. This review comprehensively encapsulates the intrinsic properties, typical synthesis methods, and applications in electronics and optoelectronics about these 2D LTSMs. To establish the fundamental theory, typical crystal structures, and physical properties of different 2D LTSMs are summarized at first. The effective synthesis strategies including exfoliation, molecular beam epitaxy, and vapor deposition are analyzed systematically. Finally, the article emphasizes the exploration of applications, significant challenges, and promising development directions of 2D LTSMs, which will drive 2D LTSMs to become the promisingly leading technology for next‐generation electronic and optoelectronic systems.

Molecular Beam Epitaxy Growth of Atomically Flat GaAs(111)A by As2

Molecular Beam Epitaxy Growth of Atomically Flat GaAs(111)A by As₂

High-quality InAs homoepitaxial layers grown by molecular beam epitaxy

The growth conditions for InAs homoepitaxy by molecular beam epitaxy were comprehensively studied across a broad spectrum of substrate temperatures, As2/In flux ratios, and growth rates. It was found that the surface morphology and overall quality of the InAs layers were significantly influenced by these parameters. Optimal conditions, including a lower growth temperature, reduced As2 flux, and slower growth rate, were pivotal in achieving high-quality InAs layers. Two primary characterization techniques, differential interference contrast microscopy and atomic force microscopy, were employed to evaluate the material quality. High-quality InAs homoepitaxial layers were successfully grown at a substrate temperature of 455 °C and a growth rate of 0.33 monolayers per second (ML/s). These layers exhibited a remarkably low defect density of approximately 300 defects per square centimeter, which is over an order of magnitude lower than previously reported, and a notably low root-mean-square roughness of 0.116 nm. At a growth rate of 0.33 ML/s, the growth temperature range for InAs homoepitaxial layers was found to be quite broad, whereas the As2/In flux ratio remained within a narrow range. This study underscores the critical role of precise control over growth parameters in the molecular beam epitaxy process for producing high-quality InAs homoepitaxial layers.

Metal-sown selective area growth of high crystalline quality InAsSb nanowires and networks by molecular-beam epitaxy

Metal-sown selective area growth of high crystalline quality InAsSb nanowires and networks by molecular-beam epitaxy

Persistent flat band splitting and strong selective band renormalization in a kagome magnet thin film.

Magnetic kagome materials provide a fascinating playground for exploring the interplay of magnetism, correlation and topology. Many magnetic kagome systems have been reported including the binary FemXn (X = Sn, Ge; m:n = 3:1, 3:2, 1:1) family and the rare earth RMn6Sn6 (R = rare earth) family, where their kagome flat bands are calculated to be near the Fermi level in the paramagnetic phase. While partially filling a kagome flat band is predicted to give rise to a Stoner-type ferromagnetism, experimental visualization of the magnetic splitting across the ordering temperature has not been reported for any of these systems due to the high ordering temperatures, hence leaving the nature of magnetism in kagome magnets an open question. Here, we probe the electronic structure with angle-resolved photoemission spectroscopy in a kagome magnet thin film FeSn synthesized using molecular beam epitaxy. We identify the exchange-split kagome flat bands, whose splitting persists above the magnetic ordering temperature, indicative of a local moment picture. Such local moments in the presence of the topological flat band are consistent with the compact molecular orbitals predicted in theory. We further observe a large spin-orbital selective band renormalization in the Fe spin majority channel reminiscent of the orbital selective correlation effects in the iron-based superconductors. Our discovery of the coexistence of local moments with topological flat bands in a kagome system echoes similar findings in magic-angle twisted bilayer graphene, and provides a basis for theoretical effort towards modeling correlation effects in magnetic flat band systems.

Optimization of MBE-grown GaSb buffer on GaAs substrates for infrared detectors

The aim of this work was to improve the quality of the GaSb buffer layers on GaAs substrates using the molecular beam epitaxy (MBE) technology. The high quality of the GaSb buffer layers is one of the most important elements enabling the synthesis of good quality of type II superlattices (T2SL) structures for infrared applications. The main challenges in this regard are: compensation of the difference in lattice constants between GaAs and GaSb and obtaining the highest achievable surface quality of the final GaSb layer. In the literature, many authors describe different techniques to obtain the best quality of a GaSb buffer layer. In this work, we present the results of HRXRD, AFM, TOF-SIMS, SEM, and Nomarski optical microscope measurements obtained for 2 μm thick GaSb buffer layers. The GaSb layers are made according to different techniques and these results are compared with a GaSb buffer construction technique according to our own technology. During the processes, we also obtained an unintentional structure of one of the buffer layers, which allowed us to obtain very good results in terms of surface structure and crystallographic quality where FWHM in ωRC scan was equal to 138 arcsec and RMS 0.20 nm proving that there is still a lot of work to be done in this area.

Route to Enhancing Remote Epitaxy of Perovskite Complex Oxide Thin Films.

Remote epitaxy is taking center stage in creating freestanding complex oxide thin films with high crystallinity that could serve as an ideal building block for stacking artificial heterostructures with distinctive functionalities. However, there exist technical challenges, particularly in the remote epitaxy of perovskite oxides associated with their harsh growth environments, making the graphene interlayer difficult to survive. Transferred graphene, typically used for creating a remote epitaxy template, poses limitations in ensuring the yield of perovskite films, especially when pulsed laser deposition (PLD) growth is carried out, since graphene degradation can be easily observed. Here, we employ spectroscopic ellipsometry to determine the critical factors that damage the integrity of graphene during PLD by tracking the change in optical properties of graphene in situ. To mitigate the issues observed in the PLD process, we propose an alternative growth strategy based on molecular beam epitaxy to produce single-crystalline perovskite membranes.

Carrier Scattering Analysis in AlN/GaN HEMT Heterostructures with an Ultrathin AlN Barrier

Experimental AlN/GaN heterostructures (HSs) with an ultrathin AlN barrier were obtained using molecular beam epitaxy with plasma activation of nitrogen. The layer resistance of the optimized structures was less than 230 Ω/¨. The scattering processes that limit the mobility of two-dimensional electron gas in undoped AlN/GaN HSs with an ultrathin AlN barrier have been studied. It is shown that in the ns range characteristic of AlN/GaN HEMT HSs (ns 1 × 1013 cm–2), a noticeable contribution to the scattering of charge carriers is made by the roughness of the heterointerface.

Heralded Generation of Correlated Photon Pairs from CdS/CdSe/CdS Quantum Shells.

Quantum information processing demands efficient quantum light sources (QLS) capable of producing high-fidelity single photons or entangled photon pairs. Single epitaxial quantum dots (QDs) have long been proven to be efficient sources of deterministic single photons; however, their production via molecular-beam epitaxy presents scalability challenges. Conversely, colloidal semiconductor QDs offer scalable solution processing and tunable photoluminescence, but suffer from broader linewidths and unstable emissions. This leads to spectrally inseparable emission from exciton (X) and biexciton (XX) states, complicating the production of single photons and triggered photon pairs. Here, we demonstrate that colloidal semiconductor quantum shells (QSs) achieve significant spectral separation (∼75-80 meV) and long temporal stability of X and XX emissive states, enabling the observation of exciton-biexciton bunching in colloidal QDs. Our low-temperature single-particle measurements show cascaded XX-X emission of single photon pairs for over 200 s, with minimal overlap between X and XX features. The X-XX distinguishability allows for an in-depth theoretical characterization of cross-correlation strength, placing it in perspective with photon pairs of epitaxial counterparts. These findings highlight a strong potential of semiconductor quantum shells for applications in quantum information processing.

Molecular Beam Epitaxy of InAsSbBi Lattice-Matched to InSb toward Long-Wave Infrared Sensing

Molecular Beam Epitaxy of InAsSbBi Lattice-Matched to InSb toward Long-Wave Infrared Sensing

Enabling 2D Electron Gas with High Room-Temperature Electron Mobility Exceeding 100cm2 Vs-1 at a Perovskite Oxide Interface.

In perovskite oxide heterostructures, bulk functional properties coexist with emergent physical phenomena at epitaxial interfaces. Notably, charge transfer at the interface between two insulating oxide layers can lead to the formation of a 2D electron gas (2DEG) with possible applications in, e.g., high-electron-mobility transistors and ferroelectric field-effect transistors. So far, the realization of oxide 2DEGs is, however, largely limited to the interface between the single-crystal substrate and epitaxial film, preventing their deliberate placement inside a larger device architecture. Additionally, the substrate-limited quality of perovskite oxide interfaces hampers room-temperature (RT) 2DEG performance due to notoriously low electron mobility. In this work, the controlled creation of an interfacial 2DEG at the epitaxial interface between perovskite oxides BaSnO3 and LaInO3 is demonstrated with enhanced RT electron mobility values up to 119 cm2 Vs-1-the highest RT value reported so far for a perovskite oxide 2DEG. Using a combination of state-of-the-art deposition modes during oxide molecular beam epitaxy, this approach opens up another degree of freedom in optimization and in situ control of the interface between two epitaxial oxide layers away from the substrate interface. Thus this approach is expected to apply to the general class of perovskite oxide 2DEG systems and to enable their improved compatibility with novel device concepts and integration across materialsplatforms.

Simulation study of a novel GaN on Si Quasi‐Vertical Reverse‐Conducting Insulated Gate Bipolar Transistor

Abstract In this paper, a novel GaN on Si quasi-vertical reverse conducting insulated gate bipolar transistor(RC-IGBT) with a new NPN structure is proposed and simulated by Silvaco TCAD. The distinctive feature of this structure lies in fabricating the original bottom P-Collector on the wafer surface. In comparison to conventional IGBT devices with PNPN structures, this NPN structure overcomes two major challenges: the difficulty in forming ohmic contacts due to the activation difficulty of the bottom P-GaN and the necessity of creating backside through-holes for electrode formation. Simultaneously, the N-GaN in the emitter and reverse-conducting regions can be selectively regrown through Metal-Organic Chemical Vapor Deposition (MOCVD) or Molecular Beam Epitaxy (MBE), avoiding the etching effect of top-layer N-GaN on P-GaN during the fabrication of P-type electrodes. This approach demonstrates a high level of process feasibility. In this paper, Silvaco TCAD is used to simulate the static and dynamic characteristics of this novel quasi-vertical RC-IGBT device. The simulation results reveal that the device has a high saturation current(Ion,sat) density of 18224.67A/cm2 at Vge=14V,a threshold voltage (Vth) of 5V,a breakdown voltage of 828V,a latch-up voltage of 800V ,and a switching speed of nanoseconds. In addition, the selection of device parameters is studied in this paper.

In situ monitoring of quantum dot growth using a magnification inferred curvature method

The growth of InAs on a GaAs (001) substrate follows the Stranski–Krastanov (S–K) growth mode. Initially, the stress due to the lattice constant difference is small, resulting in two-dimensional growth. However, as the thickness of the growth layer increases, this stress accumulates, and upon reaching a critical film thickness, the growth transitions to three-dimensional, facilitating stress relaxation. Strain changes during crystal growth can be observed through variations in substrate curvature. However, in InAs/GaAs quantum dots (QDs), these changes are minimal, making observation challenging. Previously, the curvature of the substrate during InAs/GaAs QD formation could only be estimated with low precision, necessitating the use of very thin substrates with cantilever structures to achieve higher curvature. In this study, we applied the magnification inferred curvature (MIC) method, which allows for high-precision estimation of substrate curvature during molecular beam epitaxy growth. This method enabled us to observe strain changes during the formation and relaxation processes of QDs on standard-thickness GaAs (001) substrates. The results highlight the potential of the MIC method in investigating the complex interplay of strain and stress in semiconductor growth processes, emphasizing its suitability for fabricating next-generation QD devices.

The Construction and Mechanism Study of High-Speed Carrier Transport Channel in Gallium Arsenide Homojunction Toward High-Performance Photoelectrochemical Photodetector.

The energy band structure and surface/interface properties are prerequisite for not only preserving the intrinsic material quality but also manipulating carrier transport behavior for photoelectrochemical (PEC) photodetection. How to precisely design/regulate the band structure and surface/interface properties of semiconductor materials is the key to improving the performance of PEC photodetection. Herein, the quintuple heterotypic homojunction (QH) GaAs film is fabricated with a gradient energy band via plasma-assisted molecular beam epitaxy for constructing a high-speed carrier transport channel in PEC photodetection, which can efficiently drive the separation and transport of photogenerated electron-hole pairs. The designed QH-GaAs-based PEC photodetector exhibits excellent performances, compared with bare i-GaAs, delivering an ultrashort rise/decay times of only 1.1/1.1ms and a high responsivity of 20.4mAW-1 at 0V under 850nm illumination. Strikingly, an ultrahigh detectivity with 1.46×1012 Jones is achieved. More importantly, the QH-GaAs device can stably operate underwater seawater environment. This study provides a novel strategy for designing and fabricating multiple heterotypic homojunction with gradient energy band to boost charge transport dynamics for PEC fields.