Indium oxide nanofibers (In2O3 NFs) are considered to be one of the possible channel materials for future electronic devices, however, these NFs devices suffer from low on/off current ratio (Ion/Ioff), large negative threshold voltage (VTH), and high leakage current due to the excess carriers in NFs. A facile one-step electrospinning technique is employed to synthesize metal element (aluminum (Al), chromium (Cr) or gallium (Ga)) highly-doped In2O3 NFs to both improve the electrical performance of the NFs field effect transistors (FETs) and reduce the consumption of indium. The devices exhibit optimal performance at 10 mol% doping concentration (Al, Cr and Ga): small and positive VTH (<6.0 V), large Ion/Ioff (∼108), high saturation current (∼10−4 A), and decent carrier mobility (∼2.0 cm2/V−1s−1). When a high-k AlOx thin-film is employed as the gate dielectric for the NFs FETs (10 mol% Al–In2O3 NFs), the gate voltage and drain voltage is reduced to 5 V and 3 V, respectively, and the μfe is increased by 6X. Furthermore, 10 mol% Al–In2O3 NFs FETs with enhancement-mode operation were integrated into highly efficient NMOS inverters. All the results indicate that the highly metal-doped In2O3 NFs have practical application for next-generation low-cost, large-area, energy-efficient and high-performance nanoelectronic devices.
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