Magnetron Sputtering System Research Articles

Effects of anode geometry on DC magnetron sputtering of copper oxide films deposition

Abstract Effects of anode shape are examined in a custom-made DC magnetron sputtering system. Polycrystalline copper-oxide (CuO) films are deposited using wedge, ring and disc shaped anodes. Current–voltage (I-V) characteristics of the discharge were fitted with models of plasma discharge. Above 700 V a notable rise in average plasma impedance, from approximately 2kΩ to 7kΩ was observed. Scanning electron microscope (SEM) images reveal uniform and porous film growth. The deposition increased significantly with increasing the anode surface area due to decrease in gas density in cathode sheath. For all the anode shapes tested, the deposition rates were higher in magnetron sputtering compared to DC sputtering mode. X-ray diffraction (XRD) of the films deposited with the disk anode revealed polycrystalline films with predominant CuO phase. With increasing sputtering power, average crystallite size vary from 11 nm to 21 nm, dislocation density vary from approximately 8.4×〖10〗^(-3) nm-2 to 2.3×〖10〗^(-3) nm-2 and micro strain from approximately 3.3×〖10〗^(-3) to 1.7×〖10〗^(-3). This indicate that higher sputtering at higher powers produce higher quality films. Atomic force microscopy revealed that the rms roughness of the samples is about 4 nm.

Effect of substrate rotation on the growth behavior and topography of the [formula omitted] film deposited over a large area using DC magnetron sputtering with a rectangular target: Simulation approach and experiment

It is often challenging to achieve a uniform film with the necessary surface properties when using deposition techniques. If the film is not uniformly deposited or lacks suitable surface roughness, it may not meet performance standards. To understand and control the factors controlling the deposition process, this paper presents a simulation approach to predict the growth behavior of a Ti-film deposited on substrates during the bombardment of the target with argon ions at low pressure. The simulation of the deposition process consists of several Monte Carlo simulations, which include predicting the source of the atoms flow from the target surface and tracing its trajectories through the vacuum chamber until it falls or reaches the surface of the substrates, then predicting the thickness distribution and topography of film. After conducting a comparison between simulation predictions and experimental data, it was found that the measurements obtained using the Profilometer, Scanning Electron Microscope, and Atomic Force Microscopy were relatively close. The results indicate that substrate rotation during deposition leads to a thinner film that is more uniform and less rough, it was also found that the coefficient of variation in the film thickness distribution was improved from 3.96% in the case of a non-rotating substrate to 0.33% in the case of a rotating substrate. The proposed approach can be used to improve the design of magnetron sputtering systems and to provide theoretical guidance for optimizing the thickness distribution and topographical characteristics of the performance specifications of high-quality film without economic constraints.

Semiconductor WO3 thin films deposited by pulsed reactive magnetron sputtering

A pulsed reactive magnetron sputtering system with a tungsten target and a gas mixture of argon and oxygen was investigated as a source for the deposition of semiconductor WO3 thin films on soda lime glass substrates and on the glass with transparent conductive SnO2:F (FTO) electrode. The reactive sputtering process was performed in HiPIMS mode with low pulse repetition frequency fp ≈ 50–100 Hz and short pulse duration in HiPIMS discharge Ton = 100 μs. The second mode investigated was the mid-frequency (MF) magnetron discharge with pulse frequency fp = 40 kHz and pulse length Ton = 15 μs. The plasma parameters were investigated for both HiPIMS and MF modes using the planar RF probe operating at the frequency fprobe = 350 kHz and the grid QCM with biased collector electrode. Ion density ni and tail electron temperature (Te) were determined in both pulsed reactive magnetron sputtering discharge modes with time resolution. The maximum value ni ≈ 5 · 1017 m−3 was found in the reactive HiPIMS mode, and the maximum value ni ≈ 7 · 1016 m−3 was found in the reactive MF (40 kHz) mode. The degree of ionization of sputtered particles in reactive HiPIMS was determined for different values of (QO2) and was found to be in the range of ri ≈ 0.1–0.3. The deposition rate determined by QCM in reactive HiPIMS was practically independent on (QO2), but in the case of reactive MF, the measured deposition rate decreased significantly with increasing (QO2). The WO3 films deposited in both modes have a predominantly monoclinic crystal structure. The light and dark conductivity and the light/dark conductivity ratio (Ld) were measured under dark conditions and UV light illumination. At higher (QO2), the maximum value of Ld ≈ 300 was found for MF deposited WO3 and the maximum value of Ld ≈ 30 was found for HiPIMS deposited WO3. The photoelectrochemical measurement of WO3 deposited on FTO electrodes confirmed the n-type conductivity, and these films functioned as photoanodes in photoelectrochemical cells. MF deposited WO3 films systematically exhibited slightly higher photocurrents than HiPIMS deposited WO3. It was shown that these optimum photocurrents for HiPIMS and MF were found at QO2 ≈ 80 sccm and could not be improved by further increasing of (QO2).

Improvement of titanium film uniformity by magnetron sputtering with electromagnetic coil design

A novel magnetron assembly based on a combination of permanent magnet and adjustable electromagnetic coil is proposed for improved uniformity of the magnetron sputtering deposition process. The design of the magnetron sputtering system containing a rotating substrate and an off-axis arranged magnetron. A numerical framework has been developed to describe the evolution of the plasma density and distribution of sputtered particles. Specifically, the finite element method (FEM) was used to calculate the magnetic field and to model the magnetron sputtering discharge, and binary-collision Monte Carlo method was used to determine the transport of sputtered atoms to the substrate. Through parametric analyses, it was found that increasing the substrate-to-target distance, gas pressure, and coil current intensity benefits the uniform distribution of particles. The condition where the off-axis displacement of the magnetron effectively enhances uniformity. A strategy for optimizing deposition uniformity by combining adjustable current with an off-axis magnetron arrangement was proposed, which reduce the non-uniformity of film thickness by 77.6 % compared to the traditional fixed magnetic field model.

Studies on the Morphological and Mechanical Properties of TiZrHfNiCuCo Metallic Coatings Deposited by DC Magnetron Sputtering

This research aimed to investigate the effects of input power and gas flow rate on the composition, microstructure, and mechanical properties of TiZrHfNiCuCo metallic coatings. These metallic coatings were deposited on a p-type Si wafer using a direct current magnetron sputtering system with varying input powers (100–300 W) and Ar flow rates (5–20 sccm). It was observed that increasing input power and decreasing Ar flow rate led to TiZrHfNiCuCo metallic coatings with higher hardness and smoother surfaces. The experiment resulted in the formation of a metallic amorphous coating. This study describes the mechanism by which the mechanical properties of the TiZrHfNiCuCo coating change according to sputtering parameters. Based on these results, the effects of sputter variables, such as input power and gas flow rate properties, on the properties of coatings are discussed.

Enhanced UV photodetector performance using sputtered Mg-doped ZnO thin film

In this article, we demonstrate UV photodetector synthesized using Mg-doped ZnO thin film (TF) (10 % Mg) grown on a p-Si substrate using the radio frequency (RF) magnetron sputtering system. The fabricated MgZnO TF was annealed at 500 °C in air resulting in notable changes in morphology, optical band gap and crystallinity that significantly improved the UV light sensitivity. The annealed device (MgZnO TF/p-Si) exhibited a remarkable 155-fold increase in photocurrent density compared to the as-deposited device at + 2 V bias. Also, at the same bias the annealed device (500 °C) exhibited high photosensitivity (up to 1262 times), responsivity (20.32 A/W), specific detectivity (1.82 × 1013 Jones) and external quantum efficiency (EQE) (7745 %) in comparison to the as-deposited device. Additionally, the 500 °C device achieved a low noise equivalent power (NEP) of 0.07 × 10−12 W which is about 262 times lower than that of the as-deposited device (18.4 × 10−12 W). Furthermore, on UV illumination (λ = 325 nm) the MgZnO TF/p-Si (500 °C) detector showed fast device response with rise time/fall time values of 0.26 s/0.25 s respectively at + 2 V applied bias.

Mechanical properties and tribological behavior of hard phase doped Pb/MoS2 composite films

MoS2 is commonly used as a lubricant in spacecraft applications, and it is necessary to improve the vacuum tribological properties of MoS2 films. Thus, in the current study, hard phase (Ta, Ti, and TiN) and soft metal (Pb) double-doped MoS2 composite films were designed and prepared using an unbalanced magnetron sputtering system. The microstructures and mechanical and tribological properties of the hard-soft phase doped Pb/MoS2 composite films were systematically investigated. The results showed that the synergistic effect of the hard and soft metals gave a denser MoS2 structure denser. In addition, an amorphous structure was generated along with fine crystals, leading to a structure typical of nanocrystals embedded in an amorphous phase. Furthermore, compared with the Ti-doped Pb/MoS2 film, the doped alternative hard phase (i.e. Ta and TiN) improves the mechanical properties, among which the adhesion strength of Ta-Pb/MoS2 film is the highest, and the hardness of TiN-Pb/MoS2 film is the highest. Importantly, the soft metal Pb and its sulfide are excellent lubricants, while the hard phase ensures the long-term reliability of the films. Overall, these soft-hard bimetallic-doped MoS2 films exhibit superior tribological properties to their un-doped equivalents.

Influence of deposition pressure on microstructure, mechanical and electrical properties of niobium thin films

Niobium (Nb) thin films were deposited on a Si substrate using magnetron sputtering system by varying the deposition pressure. The effect of deposition pressure on the microstructure, residual stresses, and electrical properties was investigated by systematically varying the deposition pressure from 0.15 to 0.60 Pa. The Nb thin films were characterized using hard x-ray reflectivity, grazing incidence x-ray diffraction, four point probe method, and atomic force microscopy. The films grown at lower deposition pressures had smooth surfaces and more compact structures, which are advantageous for lowering electrical resistance but had higher compressive stress. On the other hand, the films grown at higher deposition pressures had columnar type growth with less dense structures, which leads to increase in electrical resistance. However the nature of stresses transform from compressive to tensile. Hard X-ray reflectivity performed on Nb films provides direct insight into the growth and the microstructure which were correlated with the mechanical and electrical properties.

Precision depth-controlled isolated silver nanoparticle-doped diamond-like carbon coatings with enhanced ion release, biocompatibility, and mechanical performance

Silver doped diamond-like carbon (Ag/DLC) coatings are in high demand for biomedical applications such as artificial implants, surgical instruments, and medical devices. However, recent reports indicate that the excess Ag concentration required in typically made Ag/DLC coatings significantly reduces their mechanical performance and biocompatibility. Here, we propose a novel single-step approach to precisely dope small quantities of Ag in the form of isolated nanoparticles embedded at defined depths in a DLC matrix. This new Ag/DLC coating architecture is designed to release controlled Ag ion levels to fight infection in the early post-surgery stages, while a confined Ag amount maintains the excellent mechanical and biocompatibility performance of the underlying DLC coating when compared to typically made Ag/DLC coating designs. Coatings of pure DLC, typically made Ag/DLC with Ag doped throughout the carbon matrix and the new Ag/DLC design with precise Ag doping, are made using a modified magnetron sputtering system. The coatings are characterised for structural, mechanical, ion leaching, and biocompatibility profiles against L929 fibroblast cells. Results indicate that the new Ag/DLC coating requires only 2 at.% Ag to release a similar level of Ag ions (∼0.6 ppm) to a typical Ag/DLC coating with a much higher Ag content of 17 at.%. The new Ag/DLC coating design also outperforms the typical design with a 63 % increase in hardness, 100 % higher Young's modulus, and 21 % higher biocompatibility. The enhanced biomechanical performance of the proposed new Ag/DLC architecture could have significant potential for coating of future medical devices.

Nano-multilayered ZrN-Ag/Mo-S-N film design for stable anti-frictional performance at a wide range of temperatures

A multilayer film, composed by ZrN-Ag (20 nm) and Mo-S-N (10 nm) layers, combining the intrinsic lubricant characteristics of each layer was deposited using DC magnetron sputtering system, to promote lubrication in a wide-range of temperatures. The results showed that the ZrN-Ag/Mo-S-N multilayer film exhibited a sharp interface between the different layers. A face-centered cubic (fcc) dual-phases of ZrN and Ag co-existed in the ZrN-Ag layers, whilst the Mo-S-N layers displayed a mixture of hexagonal close-packed MoS2 (hcp-MoS2) nano-particles and an amorphous phase. The multilayer film exhibited excellent room temperature (RT) triblogical behavior, as compared to the individual monolayer film, due to the combination of a relative high hardness with the low friction properties of both layers. The reorientation of MoS2 parallel to the sliding direction also contributed to the enhanced anti-frictional performance at RT. At 400 °C, the reorientation of MoS2 as well as the formation of MoO3 phase were responsible for the lubrication, whilst the hard t-ZrO2 phase promoted abrasion and, consequently, led to increasing wear rate. At 600 °C, the Ag2MoO4 double-metal oxide was the responsible for the low friction and wear-resistance; furthermore, the observed transformation from t-ZrO2 to m-ZrO2, could also have contributed to the better tribological performance.

Commissioning of a modulated pulse-power magnetron sputtering system for depositing niobium thin films

A modulated pulse-power magnetron sputtering system (MPPMS) was commissioned and used to deposit niobium on copper. MPPMS utilizes a modulated pulse train with high peak-to-average energy ratios, thereby increasing the energy density leading to the production of the energetic ions. The MPPMS modulator was designed and constructed based on large voltage/current IGBT modules, which can be externally modulated, produce bi-polar waveforms, and are readily available. A high voltage power supply provides moderate current to the IGBT module to create the precise pulse structure. The MPPMS system was used to deposit ∼1 μm thick, niobium film on a copper substrate held at ∼77 K to minimize Nb atom surface diffusion and maximize intrinsic film energy. The Nb film had an average grain size of ∼8 nm.

Lithography-Free Metaplasmonic Sensors Developed by TWD/GLAD Technique

Nowadays, plasmonic sensors are the most widely used and commercialized label-free optical biosensors and have become a widespread tool for studying chemical/biochemical interactions. Label-free, real-time, and direct measurements are the major benefits of the plasmonic sensors, including high-throughput surface bio-functionalization strategies without amplification or pretreatment of the sample [1]. The working principle of plasmonic sensing has been extensively described and reviewed over the decades [2], however, the possibility to develop cheap, effective, and clinically-accepted biosensors has recently become available due to the development of nanotechnology. Briefly, these nanostructures can be localized or can be arranged on 2D arrays of plasmonic metasurfaces, and can be fabricated by single-layer metallic films and a combination of metallic and dielectric films. The most popular plasmonic metals are gold and silver due to their high conductivity and low dielectric losses. Generally, top-down nanofabrication methods based on laser/e-beam lithography have been used, including nanostencil lithography based on shadow-masked nano-pattering and nanoimprint lithography [3]. Although such technologies have a high potential to achieve scalable and cost-effective nanofabrication at the wafer scale, these processes maintain the following main challenge: a master nano-mold/pattern is required to transfer metasurfaces with an associated high cost. Therefore, other technologies are the subject of research that overcomes this limitation and still offer an outstanding quality of metallic films, such as TDW (thermal dewetting) and GLAD (glancing angle deposition) (Fig.1). These techniques do not require master nano-mold/patterns; consequently, they can achieve lithography-free large-scale plasmonic metasurfaces [4]. TDW and GLAD usually generate quasi-ordered plasmonic metasurfaces compared to conventional lithographic methods.In this paper, the experimental results of the optical sensing properties of the sensors developed by the utilization of the combination of these two technologies in a single system are presented. The TWD/GLAD magnetron sputtering system has been designed and manufactured based on the Kurt J. Lesker MAG-Torus magnetrons, supplied with DC/RF power sources and an ECR manipulator that enables deposition at various angles with maximal 20 rpm rotation speed and heating option up to 850oC. The system is controlled by the software that enables deposition of the samples with the same parameters which pave the way for fabrication of the sensors on the industrial scale. The optical-sensing system was built based on an ST-VIS-50 spectrometer (Ocean Optics) and Tungsten Halogen Source (360-2000 nm, 2800 K, Ocean Optics) and optical table from Thorlabs. The obtained reflectance measurement has shown that the utilization of the GLAD technique decreases the reflectance peak in comparison with samples deposited without GLAD (flat samples). At the same time, angles in the range of 82-86oC seem to be preferable for nanostructure fabrication.Additionally, the utilization of the TWD technique, i.e. deposition at lower temperatures in the range of 60-100oC (depending on the substrate) and then annealed at higher temperatures such as 250oC and 300oC in a vacuum and under argon flow in the deposition chamber led to increased normalized response. However, the experiments have shown that the optimal annealing time is between 30-45 min depending on the SPR multi-structure, for example for Ag (6nm), Ti (2nm), and Au (2nm) the 30min at 250oC seems to be the best set. For such compositions, the surface sensitivity (nm/nm) and bulk sensitivity (nm/RIU) are more or less the same - 0.9 and 300, respectively. The obtained results are very promising for developing cheap, rapid, and very effective biosensors for various applications. Therefore, the obtained results seem to be very interesting for the ECS conference audience, for example, the developed Ag/Ti/Au multi-structures can be applied in novel organ-on-a-chip platforms for LADMET (liberations, absorption, distribution, metabolism, excretion, and toxicology) analysis [5].Fig. 1. Schematic diagram representation of lithography free methods for developing quasi-ordered metamaterials from left to right: Thermal dewetting and glancing angle deposition. The insert shows the chiral plasmonic nanospirals fabrication by glanced angle deposition [4].

(Dielectric Science & Technology Thomas Callinan Award) Rare-Earth Luminescence in Silicon-Based Thin Film Structures

For Si-based materials to be used in solid-state lighting and silicon photonics schemes it is necessary to have precise control of the optical emission from these materials. This can be accomplished using rare earth dopants such as Ce, Tb, and Eu to obtain blue, green, and red emissions, respectively. In this talk, we first will provide a review of our work in this field and then focus on Eu-doped films, which are particularly attractive for silicon photonic applications due to their intense emission in the visible spectral region [1]. We will also discuss the benefits of introducing a novel hybrid radio frequency (RF) magnetron sputtering source in the electron cyclotron resonance (ECR) plasma enhanced chemical vapour deposition (PECVD) reactor chamber [2], using the example of Tb-doped SiON films [3]. This approach contrasts with traditional doping methods which use metal-organic precursors or ion implantation to introduce rare-earth dopant species into the host matrix.[1] F. Azmi et al., “Tunable Emission from Eu:SiOxNy Thin Films Prepared by Integrated Magnetron Sputtering and Plasma Enhanced Chemical Vapor Deposition”, J. Vac. Sci. Technol. A 40, 043402 (2022); DOI: 10.1116/6.0001761[2] J.W. Miller et al., “Integrated ECR-PECVD and Magnetron Sputtering System for Rare-Earth-Doped Si-Based Materials”, Surface and Coatings Technology 336, 99 (2018); DOI: 10.1016/j.surfcoat.2017.08.051[3] Z. Khatami et al., "A comprehensive calibration of integrated magnetron sputtering and plasma enhanced chemical vapor deposition for rare-earth doped thin films", J. Mater. Res. (2023); DOI: 10.1557/s43578-023-01207-2

Effect of deposition regime transition on the properties of Al:ZnO transparent conducting oxide layer by radio frequency magnetron sputtering system

High-quality zinc oxide thin films doped with aluminium adatoms have effectively been fabricated on pristine soda-lime silica glass substrates via radio frequency magnetron sputtering system. The deposition temperature was varied to explore the impact of deposition regime transition of as-deposited Al:ZnO thin films on their performance as transparent conducting oxide layers. In particular, the depositions were conducted at room temperature, 100 °C, 200 °C, and 300 °C, allowing for a comprehensive assessment of the resulting films. The Raman spectra depicted the modulation of Raman bands in correlation with the deposition regime transition, illustrating the impact of thermal induction on various properties of the as-deposited aluminium-doped zinc oxide thin films. Atomic force microscopy reveals the transformation from nearly spherical to elongated shape structure was obtained as the deposition process shifted from kinetic limited to thermodynamic limited regimes. The phase analysis and grazing incident of x-ray diffractometer disclose a single crystal orientation has been achieved at thermodynamic limited regime. However, two different crystal planes were predominant comparing between the surface and structural of as-deposited aluminium-doped zinc oxide thin films. It is also evident that a highly transparent with low lattice strain and better carrier concentrations of as-deposited aluminium-doped zinc oxide thin films were realized at thermodynamic limited regimes.

Duplex surface engineering of cold spray Ti coatings and physical vapor-deposited TiN and AlTiN thin films

The feasibility of a duplex coating based on cold spray technology and magnetron sputtering was evaluated for repair applications requiring a ‘thin-on-thick’ layered structure. Commercially pure angular-shaped Ti grade 4 particles are fed to a cold spray gun and accelerated toward a Ti alloy substrate to deposit thick coatings (∼4.5 mm). TiN and AlTiN thin films are deposited on polished cold spray coatings using a four-source closed-field unbalanced magnetron sputtering (CFUBMS) system. Microstructure was characterized using focused ion beam (FIB) lift-out, scanning electron microscopy (SEM), and electron channeling contrast imaging (ECCI). The nanoindentation technique was used to evaluate the mechanical properties of coatings. The H/E ratios and H3/E2 ratios for TiN films were found to be 0.098 and 0.26 GPa, respectively, while those for AlTiN films were measured at 0.066 and 0.052 GPa, respectively, suggesting higher capacity of TiN films to withstand both elastic and plastic deformation. Using scratch testing, the adhesion of TiN and AlTiN thin films to cold spray Ti was investigated, with TiN-Ti duplex coatings exhibiting better performance compared to AlTiN-Ti coatings. Tribological testing was performed on duplex coatings using a reciprocating tribometer equipped with an alumina ball counterface. The wear rate for AlTiN-Ti coatings after 2000 sliding cycles was found to be (1.0 × 10−3 ± 0.1 × 10−3 mm3/Nm), three orders of magnitudes higher than that for TiN-Ti (8 × 10−6 ± 2 × 10−6 mm3/Nm. SEM was used to reveal worn surface morphologies and cross-sectional analysis of the wear track. Subsurface microstructural changes due to wear were examined using focused ion beam cross-sectioning, revealing bending cracks and tribofilm formation.

Flexible and Disposable Hafnium Nitride Extended Gates Fabricated by Low-Temperature High-Power Impulse Magnetron Sputtering.

To obtain a high-performance extended gate field-effect transistor for pH detection, hafnium nitride (HfN) was first fabricated on an indium tin oxide on polyethylene terephthalate (ITO/PET) substrate using a high-power impulse magnetron sputter system (HiPIMS) in this study. It can be easily applied in biomedical diagnostic and environmental monitoring applications with the advantages of flexible, disposable, cost-effective, and reliable components. Various duty cycle conditions in HiPIMSs were designed to investigate the corresponding sensing performance and material properties including surface morphology and composition. As the duty cycle increased, the grain size of HfN increased. Additionally, X-ray photoelectron spectroscopy (XPS) analysis illustrated the presence of HfOxNy on the deposited HfN surface. Both behaviors could result in a better pH sensing performance based on the theory of the site-binding model. Subsequently, HfN with a 15% duty cycle exhibited excellent pH sensitivity and linearity, with values of 59.3 mV/pH and 99.8%, respectively; its hysteresis width and drift coefficient were -1 mV and 0.5 mV/h, respectively. Furthermore, this pH-sensing performance remained stable even after 2000 repeated bending cycles. These results indicate the potential and feasibility of this HiPIMS-deposited HfN for future wearable chemical applications.

Microstructural and optoelectronic properties of sputtered Al:ZnO films and Al:ZnO/Cu bilayer structures: Effects of substrate and Cu thickness

In this study, using a multi-source confocal radio frequency magnetron sputtering system, we synthesized aluminum doped zinc oxide (AZO) single layers and AZO/Cu bilayers on glass and crystalline quartz substrates with a constant AZO thickness of 65 nm and variable Cu bottom layers with a thickness of 4–13 nm. The microstructural, morphological, optical, and electrical characteristics of all samples were investigated using a variety of spectroscopic techniques. The X-ray diffraction results show that all films prepared on both substrates have a hexagonal wurtzite crystal structure and exhibit the preferred orientation along the (002) plane with some microstructural variations. The atomic force microscopy images revealed that the thickness of the Cu layer and substrate type greatly affect the films' topography and surface roughness. The transmittance spectra indicate that the single AZO layer on both substrates possess the highest average visible transmission; however, all the samples deposited on glass substrates show greater transmittance than that on quartz. Photoluminescence analysis put into evidence a decrease in ultraviolet emission with Cu thickness for both substrates, with intensities varying according to substrate type. Hall Effect measurements reveal that all samples have n-type conductivity as well as that Cu thickness has a significant impact on their electrical characteristics. Moreover, a higher value of the figure of merit is achieved with the AZO/Cu bilayer structure grown on a glass substrate with 13 nm of Cu layer thickness.

Technologia reaktywnego rozpylania magnetronowego do otrzymywania azotków III

In the present work is studied synthesis of galium nitride (GaN) and aluminum nitride (AlN) by DC Reactive Magnetron Sputtering technology. As a sputtering target was used high purity (99.9999%) Gallium and Aluminum materials and as a reagent gas was used high purity (99.9999%) Nitrogen. Magnetron sputtering system with strong magnets (1450 mT) allows to make plasma at a low preasure 3 × 10-2 Pa and deposition process was carried out at high vacuum conditions. Deposited layers of GaN and AlN on the sappire substrate was analysed by X-ray diffraction (XRD) and revealed the crystalline nature highly oriented with the (0002) for both nitrides. For chemical composition was measured X-ray Photoelectron Spectroscopy (XPS) and it was found out the ratios of Ga:N and Al:N to be 1.07 and 1.04 respectively. For surface analysis was made Scanning Electron Microscopy (SEM). Optic transmission spectra showed band gaps to be 3.43 eV and 6.13 eV for GaN and AlN respectively.

Influence of Multilayer Structure on the Structural and Mechanical Properties of TiAlN/CrN Coatings for Advanced Machining Applications

This study investigates single and multilayer TiAlN/CrN nanocomposite thin films developed using an RF magnetron sputtering system. The TiAlN and CrN layers showed a high degree of orientation, with the (200) peak being the strongest peak in both layers, and a multilayer structure was clearly observed. The surface roughness analysis using atomic force microscopy (AFM) and cross-sectional transmission electron microscopy (TEM) revealed that the TiAlN/CrN coatings had a smoother surface than the single-layer coatings and minimal intermixing between the two layers. Depth-sensing indentation measurements were used to measure the hardness and Young’s modulus of the coatings, demonstrating that TiAlN/CrN coating had the highest hardness (~16.38 GPa) and elastic modulus (~3.82 GPa) among all the coatings studied. This indicates that the TiAlN/CrN multilayer coating possesses superior mechanical properties due to its interface strength. Our findings suggest that these multilayer coatings have potential applications in tribological and decorative coatings.

Synthesis of Ag-Doped Tetrahedral Amorphous Carbon Coatings and Their Antibiofilm Efficacy for Medical Implant Application.

Tetrahedral amorphous carbon (taC) is a hydrogen-free carbon with extensive properties such as hardness, optical transparency, and chemical inertness. taC coatings have attracted much attention in recent times, as have coatings doped with a noble metal. A known antimicrobial metal agent, silver (Ag), has been used as a dopant in taC, with different Ag concentrations on the Ti64 coupons using a hybrid filtered cathodic vacuum arc (FCVA) and magnetron sputtering system. The physiochemical properties of the coated surface were investigated using spectroscopic and electron microscopy techniques. A doping effect of Ag-taC on biofilm formation was investigated and found to have a significant effect on the bacterial-biofilm-forming bacteria Staphylococcus aureus and Pseudomonas aeruginosa depending on the concentration of Ag. Further, the effect of coated and uncoated Ag-taC films on a pathogenic bacterium was examined using SEM. The result revealed that the Ag-taC coatings inhibited the biofilm formation of S. aureus. Therefore, this study demonstrated the possible use of Ag-taC coatings against biofilm-related complications on medical devices and infections from pathogenic bacteria.