Abstract
This research aimed to investigate the effects of input power and gas flow rate on the composition, microstructure, and mechanical properties of TiZrHfNiCuCo metallic coatings. These metallic coatings were deposited on a p-type Si wafer using a direct current magnetron sputtering system with varying input powers (100–300 W) and Ar flow rates (5–20 sccm). It was observed that increasing input power and decreasing Ar flow rate led to TiZrHfNiCuCo metallic coatings with higher hardness and smoother surfaces. The experiment resulted in the formation of a metallic amorphous coating. This study describes the mechanism by which the mechanical properties of the TiZrHfNiCuCo coating change according to sputtering parameters. Based on these results, the effects of sputter variables, such as input power and gas flow rate properties, on the properties of coatings are discussed.
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