Abstract
A modulated pulse-power magnetron sputtering system (MPPMS) was commissioned and used to deposit niobium on copper. MPPMS utilizes a modulated pulse train with high peak-to-average energy ratios, thereby increasing the energy density leading to the production of the energetic ions. The MPPMS modulator was designed and constructed based on large voltage/current IGBT modules, which can be externally modulated, produce bi-polar waveforms, and are readily available. A high voltage power supply provides moderate current to the IGBT module to create the precise pulse structure. The MPPMS system was used to deposit ∼1 μm thick, niobium film on a copper substrate held at ∼77 K to minimize Nb atom surface diffusion and maximize intrinsic film energy. The Nb film had an average grain size of ∼8 nm.
Published Version
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