Low-density Quantum Dots Research Articles

High-temperature continuous-wave operation of 1310 nm InAs/GaAs quantum dot lasers

Here we report 1.3 μm electrical injection lasers based on InAs/GaAs quantum dots (QDs) grown on a GaAs substrate, which can steadily work at 110 °C without visible degradation. The QD structure is designed by applying the Stranski–Krastanow growth mode in solid source molecular beam epitaxy. The density of InAs QDs in the active region is increased from 3.8 × 1010 cm−2 to 5.9 × 1010 cm−2. As regards laser performance, the maximum output power of devices with low-density QDs as the active region is 65 mW at room temperature, and that of devices with the high-density QDs is 103 mW. Meanwhile the output power of high-density devices is 131 mW under an injection current of 4 A at 110 °C.

MOVPE grown InGaAs quantum dots with emission near 1.3 [formula omitted]m for electrically driven single-photon sources

InGaAs quantum dots (QDs) with low areal density suitable for single-photon applications are fabricated on a GaAs substrate by MOVPE. AFM measurements used to investigate the dependency of QD density and size on the V/III ratio during growth reveal a low QD density of 3.2⋅107cm−2 for a high V/III ratio of 360. To allow for a targeted electrical excitation, the InGaAs QDs are embedded into a pin-LED structure containing an oxide aperture. Low temperature electroluminescence measurements show emission of a QD line at a wavelength of 1272.4 nm. Direct comparison of photoluminescence and electroluminescence spectra approve the electrical excitation of a single QD.

Improving structure design of active region of InAs quantum dots by using InAs/GaAs digital alloy superlattice

A 1.3-μm InAs quantum dot laser has been successfully fabricated on a GaAs(100) substrate by molecular beam epitaxy (MBE) technique through using InAs/GaAs digital alloy superlattices instead of the conventional InGaAs layer. The samples grown by conventional growth method and the digital alloy superlattice growth method are characterized by atomic force microscope (AFM) and photoluminescence (PL) spectroscopy. It is found that 8-period sample possesses a low quantum dot density and poor luminescence performance. With the increase of the number of growth periods, the quantum dot density of the sample increases and the luminous performance improves. This indicates that the quality of the grown sample improves with the increase of InAs/GaAs period of the InGaAs layer. When the total InAs/GaAs period is 32, the quantum dot density of the sample is high and the luminescence performance is good. After the experimental measurement, the sample DAL-0 fabricated by conventional growth method and the sample DAL-32 (32-periods InAs/GaAs digital alloy superlattices) are utilized to fabricate quantum dot laser by standard process. The performances of two types of quantum dot lasers obtained with different growth methods are characterized. It is found that the InAs quantum dot lasers fabricated by the sample grown by digital alloy superlattice method have good performances. Under continuous wave operation mode, the threshold current is 24 mA corresponding to a threshold current density of 75 A/cm<sup>2</sup>. The highest operation-temperature reaches 120 ℃. In addition, InAs quantum dot laser using digital alloy superlattice has good temperature stability. Its characteristic temperature is 55.4 K. Compared with the traditional laser, the InAs quantum dot laser grown by InAs/GaAs digital alloy superlattice has good performance in terms of threshold current density, output power and temperature stability, which indicates that high-quality laser can be obtained by this growth method. Using the InAs/GaAs digital alloy superlattice growth method, the InGaAs composition can be changed without changing the temperature of the source oven. Thus InAs quantum dot lasers with different luminescence wavelengths can be obtained through this growth method. The InAs/GaAs digital alloy superlattice structure can be used to realize different averaging of In content in the growth structure. The method provides a new idea for designing and growing the active region of quantum dot laser.

Effect of bismuth surfactant on the structural, morphological and optical properties of self-assembled InGaAs quantum dots grown by Molecular Beam Epitaxy on GaAs (001) substrates

In this work, we have investigated the effect of Bi surfactant on structural, morphological and optical properties of 5 monolayers self-assembled InGaAs quantum dots (QDs) grown on GaAs (001) substrates at various growth temperatures (435, 467 and 495 °C) by Molecular Beam Epitaxy. Two types of InGaAs QDs samples grown with and without exposure to bismuth were studied using Atomic Force Microscopy, Scanning Electron Microscopy, Transmission Electron Microscopy and Photoluminescence (PL). Our results have demonstrated that Bi-mediated growth provides improved control of several properties of InGaAs QDs including an enhancement of the QD PL peak intensity by 1.7 times as compared to InGaAs/GaAs control sample grown without Bi. In addition, a red-shift of the PL peak energy of about 40 meV was also observed when the InGaAs QDs were grown by using Bi evidencing that Bi surfactant affects considerably the size of QDs. Furthermore, the QDs grown with Bi surfactant exhibited a higher degree of size uniformity as demonstrated by the observation of narrower Full Width at Half Maximum (FWHM) of the PL peaks. We have also shown that both Bi surfactant and substrate temperature play an important role to control the density of InGaAs QDs. The QD density decreased from 8.9 × 1010 cm−2 (control sample) to 2.0 × 1010 cm−2 for the sample grown at the lowest temperature of 435 °C under Bi flux. All these approaches to control and improve the properties of self-assembled QDs are important for device applications that require high optical efficiency and low QD density.

Low-density arrays of ultra-small InAs nanostructures obtained by two-stage arsenic exposure during droplet epitaxy

In order to consider quantum dots as single objects and to use them in modern electronic and photonic devices, they must be well-isolated from each other and have an appropriate size and structural quality. This is a big challenge that is difficult to achieve with traditional technological methods, such as the Stranski-Krastanov growth mechanism. In this paper, we present a novel droplet epitaxial technique for the fabrication of small-sized (∼25 nm) InAs/GaAs nanostructures with a low surface density (<1∙108cm−2). To achieve this result, we develop a growth method based on two-stage crystallization in the arsenic flux. At the first stage, the droplet size is reduced by spreading the droplet material over the surface due to the diffusion decay of droplets in an ultra-low arsenic flux. At the second stage, crystallization is carried out in a large arsenic flux while heating the substrate in order to fix the size and shape of nanodroplets and prevent them from further decaying. We demonstrate that the size dispersion of nanostructures is small and the process is well-reproducible. Thus, the presented approach makes it possible to obtain low-density quantum dots with an ultra-small size required for advanced optical applications.

Dependence of Photoresponsivity and On/Off Ratio on Quantum Dot Density in Quantum Dot Sensitized MoS2 Photodetector.

Non-radiative energy transfer (NRET) from quantum dots (QDs) to monolayer MoS2 has been shown to greatly enhance the photoresponsivity of the MoS2 photodetector, lifting the limitations imposed by monolayer absorption thickness. Studies were often performed on a photodetector with a channel length of only a few μm and an active area of a few μm2. Here, we demonstrate a QD sensitized monolayer MoS2 photodetector with a large channel length of 40 μm and an active area of 0.13 mm2. The QD sensitizing coating greatly enhances photoresponsivity by 14-fold at 1.3 μW illumination power, as compared with a plain monolayer MoS2 photodetector without QD coating. The photoresponsivity enhancement increases as QD coating density increases. However, QD coating also causes dark current to increase due to charge doping from QD on MoS2. At low QD density, the increase of photocurrent is much larger than the increase of dark current, resulting in a significant enhancement of the signal on/off ratio. As QD density increases, the increase of photocurrent becomes slower than the increase of dark current. As a result, photoresponsivity increases, but the on/off ratio decreases. This inverse dependence on QD density is an important factor to consider in the QD sensitized photodetector design.

Role of the phase transition at GaN QDs formation on (0001)AlN surface by ammonia molecular beam epitaxy

We report an original method of GaN/AlN quantum dots (QDs) formation with low density by ammonia MBE on the (0001)AlN surface using a decomposition process of GaN thin layer. The QDs formation has been investigated in situ by reflection high-energy electron diffraction technique. Low density of quantum dots has been obtained in the range 107–109 cm−2. Single quantum dots photoluminescence lines corresponding to exciton and biexiton transitions were observed in micro-photoluminescence spectra. A lattice gas model was developed for correct description of the GaN QDs statistical ensemble on the surface. Effective interaction between QDs results in the discontinuous phase transitions (first-order phase transitions) from low density of QDs (gas branch) to condensed phase of QDs. The GaN QDs formation has been confirmed by high-resolution transmission electron microscopy and micro-photoluminescence of single quantum dots.

Fabrication of ultralow-density quantum dots by droplet etching epitaxy

Abstract

Original method of GaN and InGaN quantum dots formation on (0001)AlN surface by ammonia molecular beam epitaxy

We report original method of formation Ga(In)N/AlN quantum dots with low density by ammonia MBE on the (0001)AlN surface by using a decomposition process of Ga(In)N thin layer. Low density of quantum dots have been obtained in the range 107-109 cm-2. Single quantum dots photoluminescence lines corresponding to exciton and biexciton transitions were observed in micro-photoluminescence spectra.

A modified gradient approach for the growth of low-density InAs quantum dot molecules by molecular beam epitaxy

Two vertically stacked quantum dots that are electronically coupled, so called quantum dot molecules, are of great interest for the realization of solid state building blocks for quantum communication networks. We present a modified gradient approach to realize InAs quantum dot molecules with a low areal density so that single quantum dot molecules can be optically addressed. The individual quantum dot layers were prepared by solid source molecular beam epitaxy depositing InAs on GaAs(100). The bottom quantum dot layer has been grown without substrate rotation resulting in an In-gradient across the surface, which translated into a density gradient with low quantum dot density in a certain region of the wafer. For the top quantum dot layer, separated from the bottom quantum dot layer by a 6nm thick GaAs barrier, various InAs amounts were deposited without an In-gradient. In spite of the absence of an In-gradient, a pronounced density gradient is observed for the top quantum dots. Even for an In-amount slightly below the critical thickness for a single dot layer, a density gradient in the top quantum dot layer, which seems to reproduce the density gradient in the bottom layer, is observed. For more or less In, respectively, deviations from this behavior occur. We suggest that the obvious influence of the bottom quantum dot layer on the growth of the top quantum dots is due to the strain field induced by the buried dots.

Integrated Semiconductor Quantum Dot Scintillation Detector: Ultimate Limit for Speed and Light Yield

A picosecond-range timing of charged particles and photons is a long-standing challenge for many high-energy physics, biophysics, medical and security applications. We present a design, technological pathway and challenges, and some properties important for realization of an ultrafast high-efficient room-temperature semiconductor scintillator based on self-assembled InAs quantum dots (QD) embedded in a GaAs matrix. Low QD density ( $ ), fast ( $\sim 5~\hbox{ps}$ ) electron capture, luminescence peak redshifted by 0.2-0.3 eV from GaAs absorption edge with fast decay time (0.5-1 ns) along with the efficient energy transfer in the GaAs matrix (4.2 eV/pair) allows for fabrication of a semiconductor scintillator with the unsurpassed performance parameters. The major technological challenge is fabrication of a large volume ( $ > 1~\hbox{cm}^{3}$ ) of epitaxial QD medium. This requires multiple film separation and bonding, likely using separate epitaxial films as waveguides for improved light coupling. Compared to traditional inorganic scintillators, the semiconductor-QD based scintillators could have about 5x higher light yield and 20x faster decay time, opening a way to gamma detectors with the energy resolution better than 1% and sustaining counting rates $ > 100~\hbox{MHz}$ . Picosecond-scale timing requires segmented low-capacitance photodiodes integrated with the scintillator. For photons, the proposed detector inherently provides the depth-of-interaction information.

Single-photon and photon pair emission from MOVPE-grown In(Ga)As quantum dots: shifting the emission wavelength from 1.0 to 1.3 μm

InAs quantum dots grown on a GaAs substrate have been one of the most successful semiconductor material systems to demonstrate single-photon-based quantum optical phenomena. In this context, we present the feasibility to extend the low-temperature photoluminescence emission range of In(Ga)As/GaAs quantum dots grown by metal-organic vapor-phase epitaxy from the typical window between 880 and 960 nm to wavelengths above 1.3 μm. A low quantum dot density can be obtained throughout this range, enabling the demonstration of single- and cascaded photon emission. We further analyze polarization-resolved micro-photoluminescence from a large number of individual quantum dots with respect to anisotropy and size of the underlying fine-structure splittings in the emission spectra. For samples with elevated emission wavelengths, we observe an increasing tendency of the emitted photons to be polarized along the main crystal axes.

Photoluminescence Characterization of Vertically Coupled Low Density InGaAs Quantum Dots for the application to Quantum Information Processing Devices

Vertically coupled low density InGaAs quantum dots (QDs) buried in GaAs matrix were grown with migration enhanced molecular beam epitaxy method as a candidate for quantum information processing devices. We performed excitation power-dependent photoluminescence measurements at cryogenic temperature to analyze the effects of vertical coupling according to the variation in thickness of spacer layer. The more intense coupling effects were observed with the thinner spacer layer, which modified emission properties of QDs significantly. The low surface density of QDs was observed by atomic force microscopy, and scanning transmission electron microscopy verified the successful vertical coupling between low density QDs.

Strain-driven growth of GaAs(111) quantum dots with low fine structure splitting

Symmetric quantum dots (QDs) on (111)-oriented surfaces are promising candidates for generating polarization-entangled photons due to their low excitonic fine structure splitting (FSS). However, (111) QDs are difficult to grow. The conventional use of compressive strain to drive QD self-assembly fails to form 3D nanostructures on (111) surfaces. Instead, we demonstrate that (111) QDs self-assemble under tensile strain by growing GaAs QDs on an InP(111)A substrate. Tensile GaAs self-assembly produces a low density of QDs with a symmetric triangular morphology. Coherent, tensile QDs are observed without dislocations, and the QDs luminescence at room temperature. Single QD measurements reveal low FSS with a median value of 7.6 μeV, due to the high symmetry of the (111) QDs. Tensile self-assembly thus offers a simple route to symmetric (111) QDs for entangled photon emitters.

Effects of rapid thermal annealing on the optical properties of InAs/(In)GaAs quantum dots with different areal density

The effects of rapid thermal annealing on the optical properties of InAs/(In)GaAs quantum dots (QDs) with different areal density were investigated by photoluminescence (PL) measurement. The annealing results in PL peak energy blue-shift which strongly depends on QD areal density and capping layer. It is noticeable that low-density QDs and/or InGaAs-capped QDs are more sensitive to the annealing. We attribute the larger energy blue-shift from these samples to enhanced strain-driven diffusion and/or defect-assisted diffusion.

Telecom-wavelength (1.5 μm) single-photon emission from InP-based quantum dots

We demonstrate pronounced single-photon emission from InAs/AlGaInAs/InP quantum dots (QDs) at wavelengths above 1.5 μm that are compatible with standard long-distance fiber communication. The QDs are grown by molecular beam epitaxy on distributed Bragg reflectors. A low QD density of about 5 × 108 cm−2 was obtained using optimized growth conditions. Low-temperature micro-photoluminescence spectroscopy exhibits sharp excitonic emission lines from single QDs without the necessity of further processing steps. The combination of excitation power-dependent and polarization-resolved photoluminescence measurements reveal a characteristic exciton-biexciton behavior with biexciton binding energies that range from 3.5 to 4 meV and fine-structure splitting values down to 20 μeV.

Delayed emission from InGaAs/GaAs quantum dots grown by migration-enhanced epitaxy due to carrier localization in a wetting layer

Wetting layer (WL) photoluminescence (PL) at 10 K dominated the PL spectra of low-density quantum dots (QDs) grown by migration-enhanced epitaxy (MEE), even at very low excitation powers. Long PL rise time at the ground state (GS) of QDs was observed, when carriers are generated in the WL, indicating suppressed carrier capture from the WL into the QDs. Fluctuations in the WL thickness due to WL thinning in the MEE-grown QDs produced strong localization effects. Temperature dependence of the WL PL intensity and the GS PL rise time agreed well with this interpretation.

Bright light emissions with narrow spectral linewidths from single InAs/GaAs quantum dots directly grown on silicon substrates

High brightness light emissions from single InAs/GaAs quantum dots (QDs) epitaxially grown directly on silicon substrates are realized for the first time. The grown structures contain a low quantum dot density of about 108 cm−2. Low-temperature spatially resolved photoluminescence (PL) measurements illustrate bright single QD emissions with relatively sharp excitonic lines comparable to PL spectra of near-surface QDs grown on GaAs substrates.

Ultra low density of CdTe quantum dots grown by MBE

This work presents methods of controlling the density of self-assembled CdTe quantum dots (QDs) grown by molecular beam epitaxy. Two approaches are discussed: increasing the deposition temperature of CdTe and the reduction of CdTe layer thickness. Photoluminescence (PL) measurements at low temperature confirm that both methods can be used for significant reduction of QDs density from 1010QD/cm2 to 107–108QD/cm2. For very low QDs density, identification of all QDs lines observed in the spectrum is possible.

MBE Growth of CdTe/ZnTe Quantum Dots with Single Mn Ions

We report MBE growth and properties of samples with self assembled quantum dots with single manganese ions and low density of quantum dots. Manganese concentration was calibrated using magneto-re ectivity measurements and the giant Zeeman e ect in (Cd,Mn)Te and (Zn,Mn)Te layers. Successful incorporation of Mn in the CdTe/ZnTe quantum dots was con rmed using micro-photoluminescence measurements: single manganese ion in quantum dot manifests in sixfold splitting of exciton emission lines due to s, p d exchange interaction.